Anthony B. Nhiev
at Toppan Photomasks Inc
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | October 25, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Light sources, Reticles, Contamination, Optical spheres, Defect detection, Quartz, Manufacturing, Inspection, Photomasks, Computer aided design

PROCEEDINGS ARTICLE | March 21, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Etching, Quartz, Inspection, Chromium, Scanning electron microscopy, Printing, Photomasks, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Reticles, Deep ultraviolet, Opacity, Inspection, Scanning electron microscopy, Printing, Photomasks, Critical dimension metrology, Semiconducting wafers

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