Dr. Anthony E. Novembre
Associate Director at Princeton Univ
SPIE Involvement:
Conference Program Committee | Conference Chair | Author | Editor
Publications (39)

PROCEEDINGS ARTICLE | July 24, 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, FT-IR spectroscopy, Polymethylmethacrylate, Polymers, Silicon, Photoresist materials, Absorbance, Polymer thin films, Distributed interactive simulations, Absorption

PROCEEDINGS ARTICLE | January 22, 2001
Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Ultraviolet radiation, Silicon, Inspection, Reflectivity, Chromium, Photomasks, Extreme ultraviolet, Semiconducting wafers, Charged-particle lithography

PROCEEDINGS ARTICLE | January 22, 2001
Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Scattering, Etching, Silicon, Chromium, Silicon films, Refraction, Photomasks, Low pressure chemical vapor deposition, Semiconducting wafers, Charged-particle lithography

PROCEEDINGS ARTICLE | July 21, 2000
Proc. SPIE. 3997, Emerging Lithographic Technologies IV
KEYWORDS: Lithography, Deep ultraviolet, Polymers, Electrons, Scanning electron microscopy, Monte Carlo methods, Semiconducting wafers, Charged-particle lithography, Absorption, Chemically amplified resists

PROCEEDINGS ARTICLE | July 21, 2000
Proc. SPIE. 3997, Emerging Lithographic Technologies IV
KEYWORDS: Etching, Silicon, Photoresist materials, Photomasks, Wet etching, Plasma etching, Helium, Semiconducting wafers, Charged-particle lithography, Plasma

PROCEEDINGS ARTICLE | December 30, 1999
Proc. SPIE. 3873, 19th Annual Symposium on Photomask Technology
KEYWORDS: Lithography, Particles, Silicon, Chromium, Pellicles, Photomasks, Semiconducting wafers, Charged-particle lithography, Mask cleaning, Plasma

Showing 5 of 39 publications
Conference Committee Involvement (7)
Emerging Lithographic Technologies XII
26 February 2008 | San Jose, California, United States
Emerging Lithographic Technologies XI
27 February 2007 | San Jose, California, United States
Emerging Lithographic Technologies X
21 February 2006 | San Jose, California, United States
Emerging Lithographic Technologies IX
1 March 2005 | San Jose, California, United States
Emerging Lithographic Technologies VIII
24 February 2004 | Santa Clara, California, United States
Showing 5 of 7 published special sections
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