Anthony R. Schepis
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Publications (7)

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Diffraction, Monochromatic aberrations, Metrology, Detection and tracking algorithms, Wavefronts, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Diffraction, Refractive index, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Optics manufacturing, EUV optics, Absorption

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Optical lithography, Electroluminescence, Optical vortices, Photomasks, Critical dimension metrology, Chemical elements, Spiral phase plates, Phase shifts, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Optical lithography, 3D modeling, Monte Carlo methods, Photomasks, Directed self assembly, Computational lithography, Critical dimension metrology, Photoresist processing, Instrument modeling

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Polymethylmethacrylate, Defect detection, Etching, Image processing, Silicon, 3D modeling, Scatterometry, Directed self assembly, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Optical lithography, Data modeling, 3D modeling, Photomasks, Extreme ultraviolet, Directed self assembly, Source mask optimization, Optical proximity correction, Semiconducting wafers

Showing 5 of 7 publications
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