Anthony R. Schepis
Process Engineer at TEL
SPIE Involvement:
Publications (7)

Proceedings Article | 17 April 2014 Paper
Proceedings Volume 9048, 90482N (2014)
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Nanoimprint lithography, Refractive index, Diffraction, EUV optics, Reflectivity, Absorption, Optics manufacturing

Proceedings Article | 17 April 2014 Paper
Proceedings Volume 9048, 90482M (2014)
KEYWORDS: Metrology, Monochromatic aberrations, Wavefronts, Extreme ultraviolet lithography, Nanoimprint lithography, Diffraction, Lithography, Detection and tracking algorithms, Photomasks, Extreme ultraviolet

Proceedings Article | 31 March 2014 Paper
Kafai Lai, Melih Ozlem, Jed Pitera, Chi-chun Liu, Anthony Schepis, Daniel Dechene, Azalia Krasnoperova, Daniel Brue, Jassem Abdallah, Hsinyu Tsai, Mike Guillorn, Joy Cheng, Gregory Doerk, Melia Tjio, Rasit Topalogu, Moutaz Fakhry, Neal Lafferty
Proceedings Volume 9052, 90521A (2014)
KEYWORDS: 3D modeling, Monte Carlo methods, Computational lithography, Photomasks, Critical dimension metrology, Lithography, Photoresist processing, Instrument modeling, Optical lithography, Directed self assembly

Proceedings Article | 31 March 2014 Paper
Proceedings Volume 9052, 90521M (2014)
KEYWORDS: Photomasks, Lithography, Spiral phase plates, Optical lithography, Fiber optic illuminators, Critical dimension metrology, Electroluminescence, Chemical elements, Phase shifts, Optical vortices

Proceedings Article | 28 March 2014 Paper
Proceedings Volume 9049, 904909 (2014)
KEYWORDS: Etching, Silicon, Polymethylmethacrylate, Semiconducting wafers, Scatterometry, Image processing, 3D modeling, Line edge roughness, Defect detection, Directed self assembly

Showing 5 of 7 publications
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