Dr. Anthony J. Toprac
VP of APC Products at A Toprac Consultancy Inc
SPIE Involvement:
Conference Program Committee | Conference Chair | Author
Publications (10)

PROCEEDINGS ARTICLE | May 17, 2005
Proc. SPIE. 5755, Data Analysis and Modeling for Process Control II
KEYWORDS: Overlay metrology, Reticles, Optical lithography, Manufacturing, Detection and tracking algorithms, Algorithm development, Semiconducting wafers, Control systems, Semiconductors, Feedback control

PROCEEDINGS ARTICLE | July 1, 2003
Proc. SPIE. 5044, Advanced Process Control and Automation
KEYWORDS: Semiconducting wafers, Thermal modeling, Low pressure chemical vapor deposition, Chemical elements, Temperature metrology, Data modeling, Quartz, Numerical integration, Chemical vapor deposition, Monte Carlo methods

PROCEEDINGS ARTICLE | August 23, 2000
Proc. SPIE. 4182, Process Control and Diagnostics
KEYWORDS: Process modeling, Adaptive control, Process control, Control systems, Manufacturing, Chemical mechanical planarization, System identification, Computing systems, Device simulation, Microelectronics

PROCEEDINGS ARTICLE | August 23, 2000
Proc. SPIE. 4182, Process Control and Diagnostics
KEYWORDS: Overlay metrology, Process control, Lithography, Control systems, Manufacturing, Optical alignment, Semiconductor manufacturing, Semiconducting wafers, Feedback control, Process modeling

PROCEEDINGS ARTICLE | September 3, 1999
Proc. SPIE. 3882, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing V
KEYWORDS: Etching, Critical dimension metrology, Manufacturing, Cadmium, Control systems, Semiconducting wafers, Photoresist materials, Optical lithography, Process control, Data modeling

Showing 5 of 10 publications
Conference Committee Involvement (4)
Data Analysis and Modeling for Patterning Control III
23 February 2006 | San Jose, California, United States
Process, Equipment, and Materials Control in Integrated Circuit Manufacturing V
22 September 1999 | Santa Clara, CA, United States
Process, Equipment, and Materials Control in Integrated Circuit Manufacturing IV
23 September 1998 | Santa Clara, CA, United States
Process, Equipment, and Materials Control in Integrated Circuit Manufacturing III
1 October 1997 | Austin, TX, United States
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