Anthony Yen is Vice President and Head of Technology Development Center at ASML. He received BSEE from Purdue University and SM, EE, PhD, and MBA from MIT. He was Member of Technical Staff at Texas Instruments and was on assignment at IMEC. From 1997 to 2017, apart from three years at Cymer (now part of ASML), he was with TSMC where he first led the development of its lithography processes, making TSMC the first company to adopt 193-nm lithography in the manufacture of logic integrated circuits, and then co-led infrastructure development for next-generation-lithography technologies on assignment at SEMATECH; in his last ten years of career at TSMC, he led the development of EUV lithography, including its mask technology, for high-volume manufacturing. Yen is Fellow of SPIE and IEEE. He is a recipient of the Frits Zernike Award for Microlithography from SPIE and the Outstanding Electrical and Computer Engineer Award from Purdue University. He serves as a Distinguished Lecturer for the IEEE Electron Devices Society.
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Mask error tensor and causality of mask error enhancement for low-k1 imaging: theory and experiments
Mask error tensor and causality of mask error enhancement for low-k1 imaging: theory and experiments
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