Dr. Anthony Yen
Vice President at ASML
SPIE Involvement:
Area of Expertise:
Optical Physics , Nanopatterning , EUV Lithography , Semiconductor Technology
Profile Summary

Anthony Yen is Vice President and Head of Technology Development Center at ASML. He received BSEE from Purdue University and SM, EE, PhD, and MBA from MIT. He was Member of Technical Staff at Texas Instruments and was on assignment at IMEC. From 1997 to 2017, apart from three years at Cymer (now part of ASML), he was with TSMC where he first led the development of its lithography processes, making TSMC the first company to adopt 193-nm lithography in the manufacture of logic integrated circuits, and then co-led infrastructure development for next-generation-lithography technologies on assignment at SEMATECH; in his last ten years of career at TSMC, he led the development of EUV lithography, including its mask technology, for high-volume manufacturing. Yen is Fellow of SPIE and IEEE. He is a recipient of the Frits Zernike Award for Microlithography from SPIE and the Outstanding Electrical and Computer Engineer Award from Purdue University. He serves as a Distinguished Lecturer for the IEEE Electron Devices Society.
Publications (70)

SPIE Journal Paper | 7 December 2023 Open Access
JM3, Vol. 22, Issue 04, 049801, (December 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.049801
KEYWORDS: 3D image processing

SPIE Journal Paper | 1 November 2023
JM3, Vol. 22, Issue 04, 040501, (November 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.040501
KEYWORDS: Photoresist materials, Image resolution, Electric fields, Absorption, Extreme ultraviolet, Reflection, Standing waves, Lithography, Light absorption, Refraction

SPIE Press Book | 19 October 2023
KEYWORDS: Diffraction, Geometrical optics, Spherical lenses, Diffraction gratings, Imaging systems, Microscopes, Image acquisition, Image resolution, Beryllium, Optical spheres

SPIE Journal Paper | 14 June 2023 Open Access
Tsai-Sheng Gau, Po-Hsiung Chen, Burn J. Lin, Fu-Hsiang Ko, Chun-Kung Chen, Anthony Yen
JM3, Vol. 22, Issue 02, 023201, (June 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.2.023201
KEYWORDS: Fourier transforms, Computer simulations, Light sources and illumination, Diffraction, Ultrafast phenomena, Lithography, Matrices, Optical proximity correction, Partial coherence, Optical lithography

SPIE Journal Paper | 18 May 2023
JM3, Vol. 22, Issue 02, 020501, (May 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.2.020501
KEYWORDS: 3D image processing, Nanoimprint lithography, Diffraction gratings, Imaging systems, Diffraction, 3D mask effects, Point spread functions, Logic, Light sources and illumination, Integrated circuits

Showing 5 of 70 publications
Proceedings Volume Editor (4)

SPIE Conference Volume | 8 December 2009

SPIE Conference Volume | 4 December 2008

SPIE Conference Volume | 26 June 2003

SPIE Conference Volume | 30 July 2002

Conference Committee Involvement (32)
International Conference on Extreme Ultraviolet Lithography 2022
26 September 2022 | Monterey, California, United States
Advanced Etch Technology and Process Integration for Nanopatterning XI
26 April 2022 | San Jose, California, United States
Advanced Etch Technology and Process Integration for Nanopatterning X
22 February 2021 | Online Only, California, United States
Advanced Etch Technology for Nanopatterning IX
25 February 2020 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning VIII
25 February 2019 | San Jose, California, United States
Showing 5 of 32 Conference Committees
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