Dr. Anthony Yen
VP and Head of Technology Development Center, ASML at ASML
SPIE Involvement:
Conference Program Committee | Author
Area of Expertise:
Nanometer Lithography , Optical Physics , Semiconductor Physics , Semiconductor Technology
Profile Summary

Anthony Yen is Vice President and Head of Technology Development Center, ASML. He joined the company in 2017 with more than thirty years of experience in the field of nanolithography. He received BSEE degree from Purdue University and SM, EE, PhD, and MBA degrees from MIT. From 1991 to 1997, as Member of Technical Staff at Texas Instruments, he worked on resolution enhancing techniques and was an early investigator of optical proximity effects and their correction, culminating in its adoption in the manufacturing of SUN microprocessors. From 1997 to 2003, he was with TSMC where he first led the development of its lithography processes, making TSMC the first company to adopt 193-nm lithography in the manufacturing of (0.13 micron generation of) logic integrated circuits, and then co-led infrastructure development for next-generation-lithography technologies on assignment at SEMATECH. After a three-year stint at Cymer (now part of ASML) as Senior Vice President responsible for marketing, he returned to TSMC in 2006. As head of Nanopatterning Technology Infrastructure Division, he led the development of EUV lithography, including its mask technology, for high-volume manufacturing which began at the 7 nm node. He has over 130 US patents and 100 publications on the patterning of semiconductor devices and circuits. He is a Fellow of SPIE and the IEEE, and a recipient of the Outstanding Electrical and Computer Engineer Award from Purdue University.
Publications (55)

Proceedings Article | 14 April 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Scanners, Photons, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Convolution, Line edge roughness, Stochastic processes

Proceedings Article | 2 April 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Logic, Optical lithography, Metals, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction, Nanoimprint lithography, Resolution enhancement technologies

SPIE Press Book | 7 April 2018

Proceedings Article | 16 June 2016 Paper
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Wafer-level optics, Lithography, Mirrors, Optical lithography, Manufacturing, Photomasks, Extreme ultraviolet, Excimer lasers, Extreme ultraviolet lithography, Semiconducting wafers

SPIE Journal Paper | 3 June 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Photomasks, Image registration, Mask making, Palladium, Monte Carlo methods, Quartz, Model-based design, Scattering, Electron beam lithography, Holmium

Showing 5 of 55 publications
Proceedings Volume Editor (4)

SPIE Conference Volume | 8 December 2009

SPIE Conference Volume | 4 December 2008

SPIE Conference Volume | 26 June 2003

SPIE Conference Volume | 30 July 2002

Conference Committee Involvement (30)
Advanced Etch Technology and Process Integration for Nanopatterning X
21 February 2021 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning IX
25 February 2020 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning VIII
25 February 2019 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning VII
26 February 2018 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning VI
27 February 2017 | San Jose, California, United States
Showing 5 of 30 Conference Committees
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