Dr. Antje Laessig
at Qimonda Dresden GmbH & Co OHG
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 2 April 2007 Paper
Wolf-Dieter Domke, Sven Trogisch, Yayi Wei, Michael Sebald, Antje Laessig, David Back, Markus Bender
Proceedings Volume 6519, 65190R (2007) https://doi.org/10.1117/12.706887
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing, Lithography, Image processing, Chemically amplified resists, EUV optics, 193nm lithography, Image resolution

SPIE Journal Paper | 1 July 2006
Yayi Wei, Nickolay Stepanenko, Antje Laessig, Lars Voelkel, Michael Sebald
JM3, Vol. 5, Issue 03, 033002, (July 2006) https://doi.org/10.1117/12.10.1117/1.2358128
KEYWORDS: Semiconducting wafers, Photoresist processing, Photomasks, Contamination, Lithography, Scanners, Line edge roughness, Binary data, Head, Critical dimension metrology

Proceedings Article | 29 March 2006 Paper
Yayi Wei, M. Sebald, L. Voelkel, N. Stepanenko, A. Laessig
Proceedings Volume 6153, 615305 (2006) https://doi.org/10.1117/12.655664
KEYWORDS: Semiconducting wafers, Photoresist processing, Photomasks, Binary data, Contamination, Scanners, Line edge roughness, Head, Lithography, Astatine

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