Dr. Antje Laessig
at Qimonda Dresden GmbH & Co OHG
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 2 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Image processing, Image resolution, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing, EUV optics, 193nm lithography, Chemically amplified resists

SPIE Journal Paper | 1 July 2006
JM3 Vol. 5 Issue 03
KEYWORDS: Semiconducting wafers, Photoresist processing, Photomasks, Contamination, Lithography, Scanners, Line edge roughness, Binary data, Head, Critical dimension metrology

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Contamination, Scanners, Head, Photomasks, Line edge roughness, Photoresist processing, Semiconducting wafers, Binary data, Astatine

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