Dr. Antoine Wojdyla
Project scientist at Lawrence Berkeley National Lab
SPIE Involvement:
Conference Program Committee | Author
Publications (24)

PROCEEDINGS ARTICLE | June 1, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Speckle, Image processing, Atomic force microscopy, Photoresist materials, Fractal analysis, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Stochastic processes, EUV optics

PROCEEDINGS ARTICLE | May 29, 2018
Proc. SPIE. 10656, Image Sensing Technologies: Materials, Devices, Systems, and Applications V
KEYWORDS: Microscopes, Light sources, Optical lithography, Lithographic illumination, Inspection, Reflectivity, Data acquisition, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | May 15, 2018
Proc. SPIE. 10669, Computational Imaging III
KEYWORDS: Microscopes, Manufacturing, Reflectivity, Image resolution, Phase retrieval, Phase imaging, Extreme ultraviolet

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Phase contrast, Imaging systems, Speckle, Scattering, Scanners, Light scattering, Photomasks, Extreme ultraviolet, Airborne remote sensing

SPIE Journal Paper | June 19, 2017
JM3 Vol. 16 Issue 02
KEYWORDS: Systems modeling, Data modeling, Lithography, Tolerancing, Binary data, Photomasks, Image transmission, Semiconductors, Reticles

SPIE Journal Paper | July 12, 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Photomasks, Extreme ultraviolet, Microscopes, Extreme ultraviolet lithography, Semiconducting wafers, Scanners, Modulation, Multilayers, Fiber optic illuminators, Nickel

Showing 5 of 24 publications
Conference Committee Involvement (1)
Image Sensing Technologies: Materials, Devices, Systems, and Applications VI
14 April 2019 | Baltimore, Maryland, United States
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