Dr. Anton Barty
at Lawrence Livermore National Lab
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 3 May 2013
Proc. SPIE. 8777, Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III
KEYWORDS: Mirrors, Multilayers, X-ray optics, Polymethylmethacrylate, Signal attenuation, Photons, Reflectivity, Optical testing, Photomicroscopy, Free electron lasers

Proceedings Article | 21 May 2011
Proc. SPIE. 8078, Advances in X-ray Free-Electron Lasers: Radiation Schemes, X-ray Optics, and Instrumentation
KEYWORDS: Diffraction, Coherence imaging, Light sources, Sensors, Particles, X-rays, X-ray diffraction, X-ray imaging, Free electron lasers, Liquid crystal lasers

Proceedings Article | 21 March 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Lithography, Scanners, Inspection, Photomasks, Extreme ultraviolet, Line width roughness, Charge-coupled devices, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 21 March 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Signal to noise ratio, Optical filters, Contamination, Inspection, Reflectivity, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Signal detection

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Microscopes, Monochromatic aberrations, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Charge-coupled devices, Extreme ultraviolet lithography, Semiconducting wafers, Contrast transfer function

Proceedings Article | 13 March 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Multilayers, Scattering, Signal attenuation, Ultraviolet radiation, Light scattering, Inspection, Reflectivity, Scanning electron microscopy, Photomasks, Extreme ultraviolet

Showing 5 of 15 publications
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