Anton Haase
at Physikalisch-Technische Bundesanstalt
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Diffraction, Metrology, Scattering, X-rays, Laser scattering, Scatterometry, Monte Carlo methods, Process control, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Grazing incidence, X-ray characterization, Diffraction gratings

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Optical filters, Mirrors, Metrology, Lifetime testing equipment, Spatial filters, Sensors, Pellicles, Reflectometry, Extreme ultraviolet, Extreme ultraviolet lithography, Radiometry, Protactinium

PROCEEDINGS ARTICLE | September 24, 2015
Proc. SPIE. 9628, Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V
KEYWORDS: Mirrors, Scattering, Sensors, Crystals, Interfaces, Light scattering, Laser scattering, Reflectivity, Extreme ultraviolet, Molybdenum

PROCEEDINGS ARTICLE | September 4, 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Diffraction, Mirrors, Reticles, Data modeling, Polarization, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

PROCEEDINGS ARTICLE | October 17, 2014
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Diffraction, Deep ultraviolet, Polarization, Scattering, X-rays, Scatterometry, Finite element methods, Photomasks, Extreme ultraviolet, Diffraction gratings

PROCEEDINGS ARTICLE | September 30, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Diffraction, Scattering, Sensors, X-rays, Silicon, Laser scattering, Reflectivity, Scatterometry, Finite element methods, Extreme ultraviolet

Showing 5 of 7 publications
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