Prof. Antony J. Bourdillon
President at UhrlMasc Inc
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 20 May 2004
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Lithography, Mirrors, X-rays, Printing, Near field, Collimation, Photomasks, Synchrotrons, Semiconducting wafers, X-ray lithography

Proceedings Article | 16 June 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Lithography, X-rays, Manufacturing, Physics, Printing, Near field, Near field diffraction, Photomasks, Semiconducting wafers, X-ray lithography

Proceedings Article | 21 July 2000
Proc. SPIE. 3997, Emerging Lithographic Technologies IV
KEYWORDS: Lithography, Diffraction, X-rays, Printing, Photomasks, Synchrotrons, Critical dimension metrology, Photoresist processing, X-ray lithography, Standards development

Proceedings Article | 25 June 1999
Proc. SPIE. 3676, Emerging Lithographic Technologies III
KEYWORDS: Confocal microscopy, Lithography, Microscopes, Electron beam lithography, Luminescence, X-rays, Photomasks, Synchrotrons, Semiconducting wafers, X-ray lithography

Proceedings Article | 8 June 1998
Proc. SPIE. 3332, Metrology, Inspection, and Process Control for Microlithography XII
KEYWORDS: Oxides, Deep ultraviolet, Interfaces, Reflectivity, Scanning electron microscopy, Photoresist materials, Semiconducting wafers, Temperature metrology, Bottom antireflective coatings, Chemically amplified resists

Showing 5 of 7 publications
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