Dr. Anuja De Silva
Senior Technologist at IBM Research
SPIE Involvement:
Conference Program Committee | Author
Publications (44)

SPIE Journal Paper | 1 July 2020
JM3 Vol. 19 Issue 03
KEYWORDS: Stochastic processes, _terms under review, Fiber optic illuminators, Line edge roughness, Critical dimension metrology, Defect inspection, Extreme ultraviolet, Inspection, Optical lithography, Yield improvement

Proceedings Article | 24 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Optical lithography, Etching, Interfaces, Photoresist materials, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Stochastic processes, Photoresist developing

Proceedings Article | 23 March 2020
Proc. SPIE. 11326, Advances in Patterning Materials and Processes XXXVII
KEYWORDS: Optical lithography, Data modeling, Polymers, Interfaces, Ions, Solids, Extreme ultraviolet, Extreme ultraviolet lithography, Stochastic processes, Systems modeling

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Optical lithography, Etching, Inspection, Bridges, Extreme ultraviolet, Critical dimension metrology, Line edge roughness, Stochastic processes, Defect inspection

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Carbon, Contamination, Sensors, Calibration, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Showing 5 of 44 publications
Conference Committee Involvement (5)
Advances in Patterning Materials and Processes XXXVIII
21 February 2021 | San Jose, California, United States
International Conference on Extreme Ultraviolet Lithography 2020
20 September 2020 | Monterey, California, United States
Advances in Patterning Materials and Processes XXXVII
24 February 2020 | San Jose, California, United States
International Conference on Extreme Ultraviolet Lithography 2019
16 September 2019 | Monterey, California, United States
Advances in Patterning Materials and Processes XXXVI
25 February 2019 | San Jose, California, United States
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