Dr. Anuja De Silva
Patterning Materials & Process Project Lead at IBM Corp
SPIE Involvement:
Conference Program Committee | Author
Publications (34)

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Semiconductors, Oxides, Electron beam lithography, Optical lithography, Etching, Polymers, Interfaces, Semiconductor materials, Silicon, Head-mounted displays

SPIE Journal Paper | September 5, 2018
JM3 Vol. 18 Issue 01
KEYWORDS: Inspection, Semiconducting wafers, Stochastic processes, Extreme ultraviolet, Etching, Defect detection, Electron beam lithography, Modulation, Coating, Extreme ultraviolet lithography

SPIE Journal Paper | July 31, 2018
JM3 Vol. 18 Issue 01
KEYWORDS: Etching, Optical lithography, Extreme ultraviolet, Head-mounted displays, Silicon, Chemistry, Amorphous silicon, Argon, Polymers, Interfaces

PROCEEDINGS ARTICLE | April 9, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Optical lithography, Etching, Polymers, Dielectrics, Chemistry, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 28, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Electron beam lithography, Defect detection, Modulation, Etching, Coating, Inspection, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Amorphous silicon, Optical lithography, Etching, Argon, Polymers, Interfaces, Silicon, Chemistry, Extreme ultraviolet, Head-mounted displays

Showing 5 of 34 publications
Conference Committee Involvement (1)
Advances in Patterning Materials and Processes XXXVI
25 February 2019 | San Jose, California, United States
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