Dr. Anwei Liu
at Spectra-Physics a division of MKS Instruments
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 23 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Printing, Photomasks, Optical proximity correction, SRAF, Optimization (mathematics), Semiconducting wafers, Systems modeling, Model-based design, Resolution enhancement technologies, Alternate lighting of surfaces

Proceedings Article | 11 May 2009 Paper
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Lithographic illumination, Electroluminescence, Printing, Photomasks, SRAF, Critical dimension metrology, Optimization (mathematics), Systems modeling, Model-based design

Proceedings Article | 30 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Data modeling, Calibration, Databases, Etching, Glasses, Photomasks, Critical dimension metrology, Semiconducting wafers, Model-based design, Process modeling

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