Aravind Narayana Samy
at GLOBALFOUNDRIES Dresden Module Two GmbH & Co KG
SPIE Involvement:
Publications (8)

Proceedings Article | 3 October 2019 Paper
Proceedings Volume 11148, 111480L (2019)
KEYWORDS: Photomasks, Semiconducting wafers, Optical lithography, Critical dimension metrology, Failure analysis, Scanners, 3D modeling, Line width roughness, Reticles

Proceedings Article | 20 March 2018 Paper
Thomas Thamm, Bernd Geh, Marija Djordjevic Kaufmann, Rolf Seltmann, Alla Bitensky, Martin Sczyrba, Aravind Narayana Samy
Proceedings Volume 10587, 105870F (2018)
KEYWORDS: Photomasks, Scanners, Reticles, Light scattering, Scattering, Logic devices, Source mask optimization, Lithography

Proceedings Article | 4 September 2015 Paper
Proceedings Volume 9661, 96610E (2015)
KEYWORDS: Optical proximity correction, Chemical mechanical planarization, Semiconducting wafers, Lithography, Metals, Finite element methods, Photomasks, Resolution enhancement technologies, Surface finishing, Data modeling

Proceedings Article | 28 March 2014 Paper
Ushasree Katakamsetty, Hui Colin, Sky Yeo, Perez Valerio, Yang Qing, Quek Shyue Fong, Narayana Samy Aravind, Ruhm Matthias, Schiwon Roberto
Proceedings Volume 9053, 905312 (2014)
KEYWORDS: Lithography, Chemical mechanical planarization, Scanners, Manufacturing, Design for manufacturability, Design for manufacturing, Surface finishing, Copper, Semiconducting wafers, Finite element methods

Proceedings Article | 27 March 2014 Paper
Proceedings Volume 9051, 90510A (2014)
KEYWORDS: Optical proximity correction, 3D modeling, Calibration, Scanning electron microscopy, Data modeling, Performance modeling, 3D metrology, Cadmium, Lithography, Image quality

Showing 5 of 8 publications
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top