Ardavan Niroomand
DMTS at Micron Technology Inc
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 12 May 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Optical lithography, Inspection, Finite element methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers, Stochastic processes

Proceedings Article | 26 September 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Data modeling, Deep ultraviolet, Calibration, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 19 March 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Cadmium, Etching, Dry etching, Polymers, Silicon, Scanning electron microscopy, Line width roughness, Directed self assembly, Line edge roughness, Semiconducting wafers

SPIE Journal Paper | 7 May 2014
JM3 Vol. 13 Issue 02
KEYWORDS: Critical dimension metrology, Extreme ultraviolet lithography, Radiation effects, Etching, Extreme ultraviolet, Photomasks, Reflectivity, Semiconducting wafers, Cadmium, Lithography

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Reticles, Deep ultraviolet, Etching, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Neodymium, Electroluminescent displays

Showing 5 of 14 publications
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