Arisa Hara
at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (39)

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11326, Advances in Patterning Materials and Processes XXXVII
KEYWORDS: Etching, Critical dimension metrology, Extreme ultraviolet, Photomasks, Inspection, Extreme ultraviolet lithography, Logic devices, Stochastic processes

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11326, Advances in Patterning Materials and Processes XXXVII
KEYWORDS: Adhesives, Optical lithography, Head-mounted displays, Chemical elements, Etching, Scanning electron microscopy, Extreme ultraviolet lithography

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Critical dimension metrology, Etching, Metrology, Lithography, Semiconducting wafers, Photoresist processing, Statistical analysis, Optical lithography, Stochastic processes

Proceedings Article | 25 March 2019 Paper
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Etching, Extreme ultraviolet, Optical lithography, Photoresist materials, Logic devices, Defect detection, Extreme ultraviolet lithography, Lithography, Stochastic processes, Line edge roughness

Proceedings Article | 25 March 2019 Paper
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Etching, Optical lithography, Extreme ultraviolet, Reactive ion etching, Defect inspection, Lithography, Line edge roughness

Showing 5 of 39 publications
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