Aritoshi Sugimoto
Technical Adviser at Hitachi High-Technologies Corporation
SPIE Involvement:
Publications (10)

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Metrology, Materials processing, Interference (communication), Scanning electron microscopy, Line width roughness, Transistors, Field effect transistors, Critical dimension scanning electron microscopy, Line edge roughness, Tolerancing

SPIE Journal Paper | 1 October 2005
JM3 Vol. 4 Issue 04
KEYWORDS: Scanning electron microscopy, Electron microscopes, Spatial resolution, Electron beams, Semiconducting wafers, Monte Carlo methods, 3D metrology, Silicon, Metrology, Particles

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Metrology, Electrons, Manufacturing, Control systems, Scanning electron microscopy, Optical inspection, Monte Carlo methods, 3D metrology, Spatial resolution, Semiconducting wafers

Proceedings Article | 15 July 2003
Proc. SPIE. 5041, Process and Materials Characterization and Diagnostics in IC Manufacturing
KEYWORDS: Electron beams, Defect detection, Particles, Manufacturing, Inspection, Optical inspection, Image classification, Semiconducting wafers, Product engineering, Defect inspection

Proceedings Article | 14 June 1999
Proc. SPIE. 3677, Metrology, Inspection, and Process Control for Microlithography XIII
KEYWORDS: Oxides, Imaging systems, Spatial filters, Sensors, Particles, Silicon, Inspection, Collimation, Chemical mechanical planarization, Defect inspection

Showing 5 of 10 publications
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