Dr. Armen Kroyan
Senior Engineer
SPIE Involvement:
Author
Publications (19)

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Optical lithography, Quartz, Manufacturing, Photomasks, Optical proximity correction, Neodymium, Semiconducting wafers, Binary data, Phase shifts

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Scattering, Manufacturing, Image resolution, Image quality, Photomasks, Semiconducting wafers, Binary data, 3D image processing, Phase shifts

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Reticles, Manufacturing, Image resolution, Chromium, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 10 July 2003
Proc. SPIE. 5042, Design and Process Integration for Microelectronic Manufacturing
KEYWORDS: Lithography, Cadmium, Electroluminescence, Image quality, Photomasks, Optical proximity correction, Nanoimprint lithography, Critical dimension metrology, 193nm lithography, Resolution enhancement technologies

Proceedings Article | 26 June 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Reticles, Image processing, Manufacturing, Control systems, Image quality, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers, Tolerancing

Showing 5 of 19 publications
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