Dr. Armen Kroyan
Senior Engineer at
SPIE Involvement:
Author
Publications (19)

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Optical lithography, Quartz, Manufacturing, Photomasks, Optical proximity correction, Neodymium, Semiconducting wafers, Binary data, Phase shifts

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Scattering, Manufacturing, Image resolution, Image quality, Photomasks, Semiconducting wafers, Binary data, 3D image processing, Phase shifts

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Reticles, Manufacturing, Image resolution, Chromium, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | July 10, 2003
Proc. SPIE. 5042, Design and Process Integration for Microelectronic Manufacturing
KEYWORDS: Lithography, Cadmium, Electroluminescence, Image quality, Photomasks, Optical proximity correction, Nanoimprint lithography, Critical dimension metrology, 193nm lithography, Resolution enhancement technologies

PROCEEDINGS ARTICLE | June 26, 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Reticles, Image processing, Manufacturing, Control systems, Image quality, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers, Tolerancing

SPIE Journal Paper | April 1, 2003
JM3 Vol. 2 Issue 02
KEYWORDS: Chromatic aberrations, Image enhancement, Lithography, Excimer lasers, Image processing, Electroluminescence, Optical simulations, Lithographic illumination, Monochromatic aberrations, Deep ultraviolet

Showing 5 of 19 publications
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