Dr. Armin Bayer
at Laser-Lab Göttingen eV
SPIE Involvement:
Author
Publications (26)

Proceedings Article | 8 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Gold, Mirrors, Multilayers, Silica, Silicon, Extreme ultraviolet, Laser damage threshold, EUV optics, Plasma, Absorption

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Refractive index, Deep ultraviolet, Silica, Sensors, Calibration, Wavefronts, Semiconductor lasers, Thermal effects, Wavefront distortions, Absorption

Proceedings Article | 29 November 2010
Proc. SPIE. 7842, Laser-Induced Damage in Optical Materials: 2010
KEYWORDS: Optical components, Contamination, Doppler effect, Sensors, Satellites, Luminescence, Laser applications, Optical testing, Excimer lasers, Autoregressive models

Proceedings Article | 8 September 2010
Proc. SPIE. 7794, Optical System Contamination: Effects, Measurements, and Control 2010
KEYWORDS: Optical components, Contamination, Doppler effect, Sensors, Satellites, Luminescence, Optical testing, Laser irradiation, Excimer lasers, Autoregressive models

Proceedings Article | 23 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Gold, Mirrors, Multilayers, Silica, Silicon, Laser ablation, Extreme ultraviolet, Laser damage threshold, Plasma, Absorption

Showing 5 of 26 publications
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