Dr. Arndt Christian Duerr
at Advanced Mask Technology Ctr
SPIE Involvement:
Publications (11)

Proceedings Article | 16 November 2007 Paper
Proceedings Volume 6730, 67300P (2007) https://doi.org/10.1117/12.746953
KEYWORDS: Photomasks, Semiconducting wafers, Inspection, Reticles, Optical proximity correction, Metrology, Environmental sensing, Wafer inspection, Critical dimension metrology, Defect detection

Proceedings Article | 3 May 2007 Paper
Proceedings Volume 6533, 653309 (2007) https://doi.org/10.1117/12.736530
KEYWORDS: Photomasks, Scanners, Immersion lithography, Lithographic illumination, Opacity, Defect detection, Lithography, CCD cameras, Semiconducting wafers, Manufacturing

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 63493O (2006) https://doi.org/10.1117/12.693061
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Printing, Scanning electron microscopy, Critical dimension metrology, Manufacturing, Halftones, Solids

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 63490T (2006) https://doi.org/10.1117/12.686078
KEYWORDS: Inspection, Photomasks, Image transmission, Reticles, Printing, Optical inspection, Defect detection, Optical lithography, Semiconducting wafers, Defect inspection

Proceedings Article | 20 May 2006 Paper
Arndt Dürr, Martin Arndt, Jan Fiebig, Samuel Weiss
Proceedings Volume 6283, 62832A (2006) https://doi.org/10.1117/12.681781
KEYWORDS: Photomasks, Image processing, Reliability, Image analysis, Environmental sensing, MATLAB, Image quality, Algorithm development, Printing, Airborne remote sensing

Showing 5 of 11 publications
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