Dr. Arndt Christian Duerr
at Advanced Mask Technology Ctr
SPIE Involvement:
Author
Publications (11)

PROCEEDINGS ARTICLE | November 16, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Reticles, Metrology, Defect detection, Inspection, Wafer inspection, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Environmental sensing

PROCEEDINGS ARTICLE | May 3, 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Lithography, Lithographic illumination, Defect detection, Opacity, Scanners, Manufacturing, CCD cameras, Photomasks, Immersion lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Reticles, Optical lithography, Defect detection, Inspection, Optical inspection, Printing, Image transmission, Photomasks, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Manufacturing, Inspection, Scanning electron microscopy, Printing, Solids, Photomasks, Critical dimension metrology, Halftones, Semiconducting wafers

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: MATLAB, Image processing, Reliability, Image analysis, Printing, Image quality, Photomasks, Algorithm development, Environmental sensing, Airborne remote sensing

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Reticles, Metrology, Inspection, Printing, Photomasks, Optical simulations, Halftones, Semiconducting wafers, Airborne remote sensing, Beam homogenizers

Showing 5 of 11 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top