Dr. Arndt Christian Duerr
at Advanced Mask Technology Ctr
SPIE Involvement:
Author
Publications (11)

PROCEEDINGS ARTICLE | November 16, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Photomasks, Semiconducting wafers, Inspection, Reticles, Optical proximity correction, Metrology, Environmental sensing, Wafer inspection, Critical dimension metrology, Defect detection

PROCEEDINGS ARTICLE | May 3, 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Photomasks, Scanners, Immersion lithography, Lithographic illumination, Opacity, Defect detection, Lithography, CCD cameras, Semiconducting wafers, Manufacturing

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Inspection, Photomasks, Image transmission, Reticles, Printing, Optical inspection, Defect detection, Optical lithography, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Printing, Scanning electron microscopy, Critical dimension metrology, Manufacturing, Halftones, Solids

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Photomasks, Image processing, Reliability, Image analysis, Environmental sensing, MATLAB, Image quality, Algorithm development, Printing, Airborne remote sensing

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Photomasks, Metrology, Halftones, Airborne remote sensing, Printing, Semiconducting wafers, Beam homogenizers, Reticles, Inspection, Optical simulations

Showing 5 of 11 publications
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