Dr. Arndt Christian Duerr
at Advanced Mask Technology Ctr
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 16 November 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Reticles, Metrology, Defect detection, Inspection, Wafer inspection, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Environmental sensing

Proceedings Article | 3 May 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Lithography, Lithographic illumination, Defect detection, Opacity, Scanners, Manufacturing, CCD cameras, Photomasks, Immersion lithography, Semiconducting wafers

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Reticles, Optical lithography, Defect detection, Inspection, Optical inspection, Printing, Image transmission, Photomasks, Semiconducting wafers, Defect inspection

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Manufacturing, Inspection, Scanning electron microscopy, Printing, Solids, Photomasks, Critical dimension metrology, Halftones, Semiconducting wafers

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: MATLAB, Image processing, Reliability, Image analysis, Printing, Image quality, Photomasks, Algorithm development, Environmental sensing, Airborne remote sensing

Showing 5 of 11 publications
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