Dr. Arne Schleunitz Profile

Dr. Arne Schleunitz

CTO at micro resist technology GmbH

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Author

Publications (16)

Proceedings Article | 9 April 2024 Presentation + Paper

Challenges of photomask-based greyscale lithography with a highly-sensitive positive photoresist designed for>100µm deep greyscale patterns

Christine Schuster, Marina Heinrich, Anja Voigt, Andrew Zanzal, Patrick Reynolds, Stephen DeMoor, Gerda Ekindorf, Arne Schleunitz, Gabi Grützner

Proceedings Volume 12956, 129560H (2024) https://doi.org/10.1117/12.3010852

KEYWORDS: Film thickness, Photoresist materials, Lithography, Ultraviolet radiation, Binary data, Grayscale lithography, Standards development, Optical lithography, Glasses, Photomasks

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Proceedings Article | 9 April 2024 Poster + Paper

Assessing hybrid polymers as innovative photolithography material allowing advanced high aspect ratio/high resolution patterns for micro-optics and patterned passivation layers

M. Russew, A. Benker, J. Herrmann, T. Oberbiermann, S. Grützner, M. Koch, J. Wolf, A. Voigt, A. Schleunitz, G. Grützner

Proceedings Volume 12956, 129560R (2024) https://doi.org/10.1117/12.3010843

KEYWORDS: Polymers, Advanced patterning, Film thickness, Two photon polymerization, Passivation, Optical lithography, Micro optics, Liquids, Manufacturing, Lithography

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Proceedings Article | 9 April 2024 Presentation + Paper

Novel multi-layer nanoimprint lithography material system enabling nano-patterning of functional optical layers

M. Messerschmidt, M. Lohse, N. Heidensohn, S. Grützner, A. Schleunitz, A. Voigt, G. Grützner

Proceedings Volume 12956, 1295607 (2024) https://doi.org/10.1117/12.3010840

KEYWORDS: Etching, Nanoimprint lithography, Metals, Fabrication, Plasma, Photoresist processing, Coating, Reactive ion etching, Oxygen, Coating thickness

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Proceedings Article | 1 May 2023 Poster + Paper

Cross-functional photoresists and photopolymers enhancing micro- and nanofabrication

A. Schleunitz, C. Schuster, A. Voigt, M. Russew, M. Lohse, M. Heinrich, G. Grützner

Proceedings Volume 12497, 124970V (2023) https://doi.org/10.1117/12.2661531

KEYWORDS: Photoresist materials, Photopolymers, Lithography, Electron beam lithography, Photoresist processing, Optical lithography, Advanced patterning, Nanofabrication, Manufacturing, Nanoimprint lithography

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Proceedings Article | 1 May 2023 Presentation + Paper

Novel approach of patterning technologies enabling monolithic micro-optical components

J. Wolf, M. Ferstl, A. Voigt, S. Grützner, A. Schleunitz, G. Grützner

Proceedings Volume 12497, 124970F (2023) https://doi.org/10.1117/12.2661529

KEYWORDS: Printing, Inkjet technology, Polymers, Lenses, Manufacturing, Scanning electron microscopy, Optical components, Fabrication, Semiconducting wafers, Optics manufacturing

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Proceedings Article | 1 May 2023 Presentation + Paper

Advancing high resolution photolithography with hybrid polymers for wafer-scale manufacture of micro-optics and patterned passivation layers

Matthias Koch, Maria Russew, L. Scharfenberg, Andreas Benker, Arne Schleunitz, Gabi Grützner

Proceedings Volume 12497, 124970M (2023) https://doi.org/10.1117/12.2658408

KEYWORDS: Polymers, Optical lithography, Ultraviolet radiation, Lithography, Passivation, Advanced patterning, Transparency

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Proceedings Article | 1 May 2023 Paper

Pushing deep greyscale lithography beyond 100-µm pattern depth with a novel photoresist

Christine Schuster, Gerda Ekindorf, Anja Voigt, Arne Schleunitz, Gabi Grützner

Proceedings Volume 12497, 124970P (2023) https://doi.org/10.1117/12.2661526

KEYWORDS: Light emitting diodes, Photoresist materials, Grayscale lithography, Bubbles, Ultraviolet radiation, Light absorption, Optical lithography, Coating, Picture Archiving and Communication System

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Proceedings Article | 19 March 2018 Paper

Single-nanometer accurate 3D nanoimprint lithography with master templates fabricated by NanoFrazor lithography

T. Kulmala, C. Rawlings, M. Spieser, T. Glinsner, A. Schleunitz, F. Bullerjahn, F. Holzner

Proceedings Volume 10584, 1058412 (2018) https://doi.org/10.1117/12.2305905

KEYWORDS: Nanoimprint lithography, Silicon, Polymers, Atomic force microscopy, Lithography, Reactive ion etching, Holograms, Etching, Photoresist processing, Scanning probe lithography

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Proceedings Article | 20 February 2017 Presentation + Paper

Evaluation of hybrid polymers for high-precision manufacturing of 3D optical interconnects by two-photon absorption lithography

A. Schleunitz, J. Klein, A. Krupp, B. Stender, R. Houbertz, G. Gruetzner

Proceedings Volume 10109, 1010905 (2017) https://doi.org/10.1117/12.2252318

KEYWORDS: Polymers, Optics manufacturing, Lithography, Optical interconnects, Waveguides, Ultraviolet radiation, Wafer-level optics, Absorption, Integrated optics, Micro optics, 3D printing, Prototyping

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SPIE Journal Paper | 7 August 2015

Step-and-repeat nanoimprint on pre-spin coated film for the fabrication of integrated optical devices

Alexander Koshelev, Alexander Goltsov, Vladimir Yankov, Giuseppe Calafiore, Scott Dhuey, Simone Sassolini, Martin Messerschmidt, Arne Schleunitz, Carlos Piña-Hernandez, Fabrizio Pirri, Stefano Cabrini, Christophe Peroz

JM3, Vol. 14, Issue 03, 033506, (August 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.033506

KEYWORDS: Nanoimprint lithography, Integrated optics, Semiconducting wafers, Holograms, Etching, Electron beam lithography, Information operations, Waveguides, Oxygen, Spectroscopes

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Proceedings Article | 3 April 2015 Paper

Towards high precision manufacturing of 3D optical components using UV-curable hybrid polymers

A. Schleunitz, J. Klein, R. Houbertz, M. Vogler, G. Gruetzner

Proceedings Volume 9368, 93680E (2015) https://doi.org/10.1117/12.2076252

KEYWORDS: Polymers, Optics manufacturing, Waveguides, Lithography, Microlens, Optical components, Optical interconnects, Manufacturing, Ultraviolet radiation, Nanoimprint lithography

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SPIE Journal Paper | 21 October 2014

Inkjetable and photo-curable resists for large-area and high-throughput roll-to-roll nanoimprint lithography

Manuel Thesen, Dieter Nees, Stephan Ruttloff, Maximilian Rumler, Mathias Rommel, Florian Schlachter, Susanne Grützner, Marko Vogler, Arne Schleunitz, Gabi Grützner

JM3, Vol. 13, Issue 04, 043003, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.043003

KEYWORDS: Nanoimprint lithography, Etching, Silicon, Dry etching, Polymers, Photoresist processing, Nickel, Inkjet technology, Nanostructures, Reactive ion etching

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Proceedings Article | 28 March 2014 Paper

Enabling large area and high throughput roll-to-roll NIL by novel inkjetable and photo-curable NIL resists

Manuel Thesen, Maximilian Rumler, Florian Schlachter, Susanne Grützner, Christian Moormann, Mathias Rommel, Dieter Nees, Stephan Ruttloff, Stefan Pfirrmann, Marko Vogler, Arne Schleunitz, Gabi Grützner

Proceedings Volume 9049, 90490H (2014) https://doi.org/10.1117/12.2046279

KEYWORDS: Nanoimprint lithography, Etching, Dry etching, Silicon, Photoresist processing, Positron emission tomography, Surface roughness, Semiconducting wafers, Nanostructures, Refractive index

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Proceedings Article | 27 March 2014 Paper

Removal of highly crosslinked resists and hybrid polymers for single micro parts fabrication and nanoimprint stamp rework

Anja Voigt, Rainer Engelke, Gisela Ahrens, Franziska Bullerjahn, Arne Schleunitz, Jan Klein, Gabi Grützner

Proceedings Volume 9051, 90511H (2014) https://doi.org/10.1117/12.2046253

KEYWORDS: Etching, Polymers, Nanoimprint lithography, Plasma etching, Plasma, Silicon, Dry etching, Oxygen, Nickel, Gases

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Proceedings Article | 7 March 2014 Paper

UV-curable hybrid polymers for optical applications: technical challenges, industrial solutions, and future developments

G. Gruetzner, J. Klein, M. Vogler, A. Schleunitz

Proceedings Volume 8974, 897406 (2014) https://doi.org/10.1117/12.2043038

KEYWORDS: Polymers, Ultraviolet radiation, Refractive index, Nanofabrication, Lithography, Transmittance, Optical lithography, Carbon dioxide, UV optics, Optics manufacturing

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Proceedings Article | 29 June 2005 Paper

Toward a biophotonic MEMS cell sensor

Michael Powers, Stephan Koev, Arne Schleunitz, Hyunmin Yi, Vildana Hodzic, William Bentley, Gregory Payne, Gary Rubloff, Reza Ghodssi

Proceedings Volume 5839, (2005) https://doi.org/10.1117/12.608531

KEYWORDS: Waveguides, Microfluidics, Electrodes, Channel projecting optics, Biomedical optics, Wafer-level optics, Transducers, Semiconducting wafers, Biological research, Photoresist materials

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Showing 5 of 16 publications

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