Dr. Aron J. Cepler
Application Scientist at Nova Measuring Instruments Inc
SPIE Involvement:
Publications (27)

Proceedings Article | 27 April 2023 Presentation + Paper
Stefan Schoeche, Daniel Schmidt, Marjorie Cheng, Aron Cepler, Abraham Arceo de la Pena, Jennifer Oakley
Proceedings Volume 12496, 124960D (2023) https://doi.org/10.1117/12.2658458
KEYWORDS: Annealing, Raman spectroscopy, Semiconducting wafers, Silicon, Metals, Copper, Oxides, Chemical mechanical planarization, Reactive ion etching, Phonons

SPIE Journal Paper | 21 February 2023 Open Access
JM3, Vol. 22, Issue 03, 031203, (February 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.3.031203
KEYWORDS: Metrology, Interferometry, Data modeling, Tunable filters, Semiconducting wafers, Scatterometry, Optical filters, Machine learning, Education and training, Dielectrics

Proceedings Article | 8 June 2022 Presentation + Paper
M. Medikonda, D. Schmidt, M. Rizzolo, M. Breton, A. Dutta, H. Wu, E. Evarts, A. Cepler, R. Koret, I. Turovets, D. Edelstein
Proceedings Volume PC12053, PC120530J (2022) https://doi.org/10.1117/12.2614137
KEYWORDS: Metrology, Resistance, Critical dimension metrology, Chemical mechanical planarization, Logic, Data modeling, Instrument modeling, Scatterometry, Semiconducting wafers, Machine learning

Proceedings Article | 26 May 2022 Presentation + Paper
Proceedings Volume 12053, 120530S (2022) https://doi.org/10.1117/12.2614077
KEYWORDS: Metrology, Semiconducting wafers, Scatterometry, Optical filters, Dielectrics, Data modeling, Back end of line, Front end of line, Chemical mechanical planarization, Transmission electron microscopy

SPIE Journal Paper | 27 January 2022 Open Access
JM3, Vol. 21, Issue 02, 021203, (January 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.2.021203
KEYWORDS: Silicon, Germanium, Raman spectroscopy, Optical lithography, Manufacturing, Semiconducting wafers, Polarization, Metrology, Raman scattering, Phonons

Showing 5 of 27 publications
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