Dr. Aron J. Cepler
Application Scientist at Nova Measuring Instruments Inc
SPIE Involvement:
Author
Publications (20)

Proceedings Article | 4 May 2020
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Scatterometry, Machine learning, Semiconducting wafers, Critical dimension metrology, Etching, Photoresist materials, Lithography, Metrology, Scatter measurement, Data modeling

Proceedings Article | 2 July 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Machine learning, Scatterometry, Copper

Proceedings Article | 5 September 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Scatterometry, Semiconducting wafers, Scanning electron microscopy, Machine learning, Metrology, Data modeling, Scatter measurement, Mathematical modeling, Transmission electron microscopy, Field effect transistors

Proceedings Article | 19 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Gallium arsenide, Etching, Silicon, Measurement devices, Geometrical optics, X-ray fluorescence spectroscopy, Semiconductors, Nanolithography

Proceedings Article | 12 April 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Copper, Metrology, Resistance, Machine learning, Metals, Back end of line, Semiconducting wafers, Scatterometry, X-rays, Process control

Showing 5 of 20 publications
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