Dr. Arpan P. Mahorowala
Research Staff Member at IBM TJ Watson Research Ctr
SPIE Involvement:
Author
Publications (23)

PROCEEDINGS ARTICLE | March 21, 2007
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Lithography, Optical lithography, Cadmium, Etching, Diffusion, Manufacturing, Integrated circuits, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Logic, Image processing, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Photoresist processing, Tolerancing, Model-based design, Process modeling

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Oxides, Lithography, Optical lithography, Etching, Polymers, Silicon, Reflectivity, Photoresist materials, Silicon films, Reactive ion etching

PROCEEDINGS ARTICLE | March 14, 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Lithography, Reticles, Cadmium, Etching, Control systems, Photomasks, Immersion lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: FT-IR spectroscopy, Etching, Polymers, Surface roughness, Atomic force microscopy, Photoresist materials, Line edge roughness, Semiconducting wafers, Polymer thin films, Plasma

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Diffraction, Metrology, Scattering, X-rays, Laser scattering, Fourier transforms, Photoresist materials, Line edge roughness, Edge roughness, Diffraction gratings

Showing 5 of 23 publications
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