Dr. Artak Isoyan
Sr. Staff R&D Engineer at Synopsys Inc
SPIE Involvement:
Area of Expertise:
Modeling , Electron Beam Lithography , Computational Lithography , Photolithography , Optical Proximity Correction , Software Product Development
Profile Summary

- Modeling of semiconductor photolithography manufacturing process for the purpose of Optical Proximity Correction.
- Knowledge semiconductor processing
- Electron-beam Lithography, SEM & AFM Metrology
- Software Product Development
- Process Research and Development
Publications (16)

Proceedings Article | 19 March 2018 Paper
Proceedings Volume 10583, 105831S (2018) https://doi.org/10.1117/12.2296864
KEYWORDS: Photomasks, Reflectivity, Extreme ultraviolet, Silicon, Molybdenum, Semiconducting wafers, Reflectors, Critical dimension metrology, Optical proximity correction, Reticles

Proceedings Article | 16 October 2017 Presentation + Paper
Proceedings Volume 10450, 104500F (2017) https://doi.org/10.1117/12.2282008
KEYWORDS: Reflectivity, Near field, Photomasks, Extreme ultraviolet, Silicon, Reticles, Molybdenum, Semiconducting wafers

Proceedings Article | 30 March 2017 Presentation + Paper
Lawrence Melvin, Artak Isoyan, Chander Sawh
Proceedings Volume 10147, 101470X (2017) https://doi.org/10.1117/12.2258055
KEYWORDS: Optical proximity correction, Photomasks, Critical dimension metrology, Semiconducting wafers, Cadmium sulfide, Lithographic illumination, Computational lithography, Image processing, Process control, Data modeling, Reticles, Resolution enhancement technologies, Error analysis, Optical lithography

Proceedings Article | 24 March 2017 Presentation + Paper
Artak Isoyan, Chander Sawh, Lawrence Melvin
Proceedings Volume 10147, 101470M (2017) https://doi.org/10.1117/12.2257674
KEYWORDS: Optical proximity correction, Contamination, Image acquisition, Semiconducting wafers, Cadmium sulfide, Critical dimension metrology, Photomasks, Manufacturing, Failure analysis, Source mask optimization, Picosecond phenomena, Nano opto mechanical systems, Scanners, Data modeling

Proceedings Article | 28 August 2014 Paper
A. Kuyumchyan, A. Suvorov, T. Ishikawa, V. Aristov, E. Shulakov, A. Isoyan, N. Kuyumchyan, V. Mkrtchyan
Proceedings Volume 9170, 91700V (2014) https://doi.org/10.1117/12.2061560
KEYWORDS: X-rays, Diffraction, Silicon, Phase shifts, Zone plates, X-ray optics, Nanolithography, Electron beam lithography, Optical components, Crystals

Showing 5 of 16 publications
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