Arthur Lin
Sr Staff Field Applications Engineer at KLA-Tencor Taiwan
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Author
Publications (5)

Proceedings Article | 27 March 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Semiconductors, Lithography, Radon, Etching, Computer simulations, Photoresist materials, Photomasks, Double patterning technology, Source mask optimization, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 5 April 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Lithography, Metrology, Calibration, Image segmentation, Control systems, Scatterometry, High volume manufacturing, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Logic, Optical lithography, Cadmium, Etching, Photoresist materials, Photomasks, Optical simulations, Double patterning technology, Critical dimension metrology

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Light sources, Reticles, Logic, Optical lithography, Laser applications, Control systems, Laser scanners, Logic devices, SRAF, Critical dimension metrology

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Seaborgium, Data modeling, Calibration, 3D modeling, Photomasks, Optical simulations, Semiconducting wafers, Performance modeling, 3D image processing, Instrument modeling

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