Prof. Arthur Tay Profile

Prof. Arthur Tay

Associate Professor

SPIE Involvement:

Author

Publications (22)

Proceedings Article | 28 May 2013 Paper

OPC mask simplification using over-designed timing slack of standard cells

Yifan Qu, Chun Huat Heng, Arthur Tay, Tong Heng Lee

Proceedings Volume 8764, 87640O (2013) https://doi.org/10.1117/12.2018921

KEYWORDS: Photomasks, Optical proximity correction, Transistors, Manufacturing, Lithography, Resolution enhancement technologies, Device simulation, Very large scale integration, Application specific integrated circuits, Integrated circuit design

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Proceedings Article | 3 April 2012 Paper

In-situ critical dimension control during post-exposure bake with spectroscopic ellipsometry

Yit Sung Ngo, Yifan Qu, Arthur Tay, Tong Heng Lee

Proceedings Volume 8324, 83242N (2012) https://doi.org/10.1117/12.916133

KEYWORDS: Semiconducting wafers, Photoresist materials, Spectroscopy, Critical dimension metrology, Spectroscopic ellipsometry, Calcium, Ellipsometry, Temperature metrology, Polarizers, Chemically amplified resists

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Proceedings Article | 15 March 2012 Paper

Fast optical proximity correction with timing optimization ready standard cells

Yifan Qu, Chun Huat Heng, Arthur Tay, Tong Heng Lee

Proceedings Volume 8327, 832714 (2012) https://doi.org/10.1117/12.916124

KEYWORDS: Optical proximity correction, Photomasks, Diffusion, Resolution enhancement technologies, Lithography, Transistors, Performance modeling, Digital electronics, Device simulation, Fabrication

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Proceedings Article | 3 April 2010 Paper

Library-based performance-based OPC

Siew-Hong Teh, Chun-Huat Heng, Arthur Tay

Proceedings Volume 7641, 76410X (2010) https://doi.org/10.1117/12.846469

KEYWORDS: Optical proximity correction, Photomasks, Ions, Transistors, Databases, Device simulation, Lithography, Model-based design, Very large scale integration, Digital electronics

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Proceedings Article | 2 April 2010 Paper

Monitoring and control of photoresist properties and CD during photoresist processing

Geng Yang, Yit-Sung Ngo, Andi Putra, Kar-Tien Ang, Arthur Tay, Zhong-Ping Fang

Proceedings Volume 7638, 763828 (2010) https://doi.org/10.1117/12.846560

KEYWORDS: Semiconducting wafers, Photoresist materials, Lithography, Critical dimension metrology, Spectroscopy, Photoresist processing, Manufacturing, Process control, Sensors, Resistance

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Proceedings Article | 14 December 2009 Paper

In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence

Xiaodong Wu, Geng Yang, Ee-Xuan Lim, Arthur Tay

Proceedings Volume 7520, 752035 (2009) https://doi.org/10.1117/12.847879

KEYWORDS: Semiconducting wafers, Photoresist materials, Mass attenuation coefficient, Lithography, Spectroscopy, Reflectivity, Microelectronics, Process control, Signal attenuation, Control systems

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Proceedings Article | 3 April 2008 Paper

CD uniformity control via real-time control of photoresist properties

Ming Chen, Jun Fu, Weng Khuen Ho, Arthur Tay

Proceedings Volume 6922, 69220Y (2008) https://doi.org/10.1117/12.771418

KEYWORDS: Photoresist materials, Semiconducting wafers, Critical dimension metrology, Lithography, Thin films, Control systems, Integrated circuits, Photoresist processing, Optical lithography, Spectroscopy

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Proceedings Article | 25 March 2008 Paper

In-situ real-time temperature control of baking systems in lithography

Yuheng Wang, Hui-Tong Chua, Arthur Tay

Proceedings Volume 6922, 692237 (2008) https://doi.org/10.1117/12.772719

KEYWORDS: Semiconducting wafers, Control systems, Lithography, Systems modeling, Convection, Thermal modeling, Temperature sensors, Data modeling, Sensors, Temperature metrology

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Proceedings Article | 4 March 2008 Paper

Device performance-based OPC for optimal circuit performance and mask cost reduction

Siew-Hong Teh, Chun-Huat Heng, Arthur Tay

Proceedings Volume 6925, 692511 (2008) https://doi.org/10.1117/12.772285

KEYWORDS: Photomasks, Optical proximity correction, Ions, Transistors, Control systems design, Molybdenum, Resolution enhancement technologies, Standards development, Optical lithography, Design for manufacturability

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Proceedings Article | 5 April 2007 Paper

Real-time spatial control of photoresist development rate

Arthur Tay, Weng-Khuen Ho, Ni Hu, Choon-Meng Kiew, Kuen-Yu Tsai

Proceedings Volume 6518, 65182N (2007) https://doi.org/10.1117/12.711509

KEYWORDS: Photoresist developing, Photoresist materials, Semiconducting wafers, Lithography, Spectrometers, Critical dimension metrology, Process control, Photoresist processing, Reflectivity, Integrated circuits

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Proceedings Article | 5 April 2007 Paper

Influence of wafer warpage on photoresist film thickness and extinction coefficient measurements

Xiaodong Wu, Arthur Tay

Proceedings Volume 6518, 65184F (2007) https://doi.org/10.1117/12.711493

KEYWORDS: Semiconducting wafers, Mass attenuation coefficient, Reflectivity, Refractive index, Photoresist materials, Sensors, Calibration, Light, Signal attenuation, Reflectometry

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Proceedings Article | 21 March 2007 Paper

A heater plate assisted integrated bake/chill system for photoresist processing

Hui-Tong Chua, Arthur Tay, Yuheng Wang, Xiaodong Wu

Proceedings Volume 6519, 65193H (2007) https://doi.org/10.1117/12.711688

KEYWORDS: Semiconducting wafers, Mica, Control systems, Temperature metrology, Thermoelectric materials, Photoresist processing, Device simulation, System integration, Optical lithography, Thermography

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SPIE Journal Paper | 1 May 2006

Simple tilt and height location monitoring of wafers

Tuck Wah Ng, Arthur Tay, Chang Jeh Ong

OE, Vol. 45, Issue 05, 053603, (May 2006) https://doi.org/10.1117/12.10.1117/1.2203357

KEYWORDS: Semiconducting wafers, Reflectometry, Optical alignment, Thin films, Spectroscopy, Sensors, Optical engineering, Light, Reflectivity, Photodetectors

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Proceedings Article | 11 April 2006 Paper

A lamp thermoelectricity based integrated bake/chill system for advanced photoresist processing

Arthur Tay, Hui-Tong Chua, Xiaodong Wu, Yuheng Wang

Proceedings Volume 6153, 61534M (2006) https://doi.org/10.1117/12.654331

KEYWORDS: Semiconducting wafers, Lamps, Ceramics, Photoresist processing, Thermoelectric materials, Control systems, Chemical elements, Metals, Lithography, Data modeling

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Proceedings Article | 10 March 2006 Paper

Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography

Arthur Tay, Weng-Khuen Ho, Ni Hu, Kuen-Yu Tsai, Ying Zhou

Proceedings Volume 6155, 61550A (2006) https://doi.org/10.1117/12.654741

KEYWORDS: Semiconducting wafers, Optical lithography, Control systems, Thermal modeling, Resistance, Temperature sensors, Photoresist processing, Sensors, Process control, Critical dimension metrology

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Proceedings Article | 17 May 2005 Paper

Real-time control of photoresist development process

Arthur Tay, Weng-Khuen Ho, Choon-Meng Kiew, Ying Zhou, Jay Lee

Proceedings Volume 5755, (2005) https://doi.org/10.1117/12.599630

KEYWORDS: Photoresist developing, Photoresist materials, Semiconducting wafers, Process control, Spectroscopy, Critical dimension metrology, Photoresist processing, Optical lithography, Control systems, Lithography

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Proceedings Article | 17 May 2005 Paper

Real-time control of photoresist absorption coefficient uniformity

Arthur Tay, Weng-Khuen Ho, Xiaodong Wu, Kuen-Yu Tsai

Proceedings Volume 5755, (2005) https://doi.org/10.1117/12.598582

KEYWORDS: Absorption, Photoresist materials, Semiconducting wafers, Spectrometers, Photoresist processing, Lithography, Sensors, Process control, Critical dimension metrology, Manufacturing

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Proceedings Article | 14 May 2004 Paper

A novel wafer baking system using hot air streams

Lan Wang, Siew Loong Chow, Ai Poh Loh, Zhi Ming Gong, Woei Wan Tan, Arthur Tay, Weng Khuen Ho

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534753

KEYWORDS: Semiconducting wafers, Prototyping, Temperature metrology, Lithography, Critical dimension metrology, Computer simulations, Process modeling, Solids, Manufacturing, 3D modeling

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Proceedings Article | 20 April 2001 Paper

Spatially programmable thermal processing module for 300-mm wafer processing

Arthur Tay, Khiang Lim, Ai Poh Loh, Woei Wan Tan, Weng Khuen Ho, Anya Huang, Fu Jun

Proceedings Volume 4405, (2001) https://doi.org/10.1117/12.425238

KEYWORDS: Temperature metrology, Semiconducting wafers, Control systems, Process control, Sensors, Photoresist materials, Optical lithography, Manufacturing, Critical dimension metrology, Lithography

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Proceedings Article | 20 October 2000 Paper

Minimum-time optimal feedforward control of conductive heating systems for microelectronics processing of silicon wafers and quartz photomasks

Weng Khuen Ho, Arthur Tay

Proceedings Volume 4226, (2000) https://doi.org/10.1117/12.404846

KEYWORDS: Semiconducting wafers, Control systems, Computer programming, Photomasks, Silicon, Temperature metrology, Holmium, Feedback control, Quartz, Reticles

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Proceedings Article | 3 September 1999 Paper

Optimal control strategy using linear programming for load disturbance compensation in thermal processing systems

Weng Khuen Ho, Arthur Tay, Charles Schaper

Proceedings Volume 3882, (1999) https://doi.org/10.1117/12.361294

KEYWORDS: Semiconducting wafers, Temperature metrology, Data modeling, Control systems, Computer programming, Feedback control, Photomasks, Photoresist processing, Temperature sensors, Thermal modeling

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Proceedings Article | 3 September 1999 Paper

Spatially programmable temperature control and measurement for chemically amplified photoresist processing

Charles Schaper, Khalid El-Awady, Arthur Tay

Proceedings Volume 3882, (1999) https://doi.org/10.1117/12.361326

KEYWORDS: Temperature metrology, Semiconducting wafers, Photomasks, Photoresist materials, Chemical elements, Photoresist processing, Control systems, Feedback control, Process control, Silicon

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Showing 5 of 22 publications

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