Dr. Artur P. Balasinski
Sr Principal Engineer at Cypress Semiconductor Corp
SPIE Involvement:
Scholarship Committee | Conference Program Committee | Author
Publications (30)

PROCEEDINGS ARTICLE | October 1, 2013
Proc. SPIE. 8886, 29th European Mask and Lithography Conference
KEYWORDS: Lithography, Optical lithography, Patents, Data modeling, Calibration, Etching, Manufacturing, Design for manufacturing, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | September 27, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Semiconductors, Data modeling, Data storage, Databases, Manufacturing, Photomasks, Computer aided design, Document management, Data communications, Design for manufacturability

PROCEEDINGS ARTICLE | December 28, 2007
Proc. SPIE. 6798, Microelectronics: Design, Technology, and Packaging III
KEYWORDS: Lithography, Calibration, Etching, Manufacturing, Design for manufacturing, Field effect transistors, Optical proximity correction, Computer aided design, Analog electronics, System on a chip

PROCEEDINGS ARTICLE | December 28, 2007
Proc. SPIE. 6798, Microelectronics: Design, Technology, and Packaging III
KEYWORDS: Oxides, Etching, Dielectrics, Silicon, Chemistry, Design for manufacturing, Field effect transistors, Optical proximity correction, Deposition processes, Semiconducting wafers

PROCEEDINGS ARTICLE | December 21, 2007
Proc. SPIE. 6798, Microelectronics: Design, Technology, and Packaging III
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Design for manufacturing, Photomasks, Extreme ultraviolet, Double patterning technology, Nanoimprint lithography, Overlay metrology

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Metrology, Databases, Error analysis, Manufacturing, Inspection, Control systems, Photomasks, Optical proximity correction, Computer aided design, Semiconducting wafers

Showing 5 of 30 publications
Conference Committee Involvement (6)
Photomask Technology
11 September 2017 | Monterey, California, United States
Photomask Technology
19 September 2011 | Monterey, California, United States
Photomask Technology
15 September 2009 | Monterey, California, United States
Photomask Technology
7 October 2008 | Monterey, California, United States
Photomask Technology
18 September 2007 | Monterey, California, United States
Showing 5 of 6 published special sections
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