Dr. Arun John Kadaksham
Member Technical Staff at SUNY Poly SEMATECH
SPIE Involvement:
Author
Area of Expertise:
Nanoparticle Adhesion , Fluid Dynamics and Micro Fluid Flow Control , Advanced particle removal and cleaning techniques , Acoustic Cavitation
Publications (22)

PROCEEDINGS ARTICLE | July 28, 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Oxides, Interfaces, Silicon, Oxygen, Finite element methods, Photomasks, Extreme ultraviolet, Neodymium, Ruthenium, Oxidation

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Quartz, Capillaries, Particles, Chemistry, Inspection, Humidity, Photomasks, Extreme ultraviolet, Atomic force microscope, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Multilayers, Silica, Ions, Inspection, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Failure analysis, Ruthenium

PROCEEDINGS ARTICLE | October 3, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Reticles, Ultraviolet radiation, Mercury, Lamps, Reflectivity, Oxygen, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Ruthenium

PROCEEDINGS ARTICLE | October 1, 2013
Proc. SPIE. 8886, 29th European Mask and Lithography Conference
KEYWORDS: Multilayers, Optical lithography, Ions, Coating, Reflectivity, Ion beams, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Deposition processes

PROCEEDINGS ARTICLE | September 23, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Polishing, Particles, Inspection, Surface roughness, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Magnetorheological finishing, Surface finishing, Chemical mechanical planarization

Showing 5 of 22 publications
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