Dr. Arun John Kadaksham
Member Technical Staff at SUNY Poly SEMATECH
SPIE Involvement:
Author
Area of Expertise:
Nanoparticle Adhesion , Fluid Dynamics and Micro Fluid Flow Control , Advanced particle removal and cleaning techniques , Acoustic Cavitation
Publications (22)

PROCEEDINGS ARTICLE | July 28, 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Ruthenium, Silicon, Extreme ultraviolet, Finite element methods, Interfaces, Oxides, Oxygen, Neodymium, Photomasks, Oxidation

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Humidity, Quartz, Chemistry, Capillaries, Particles, Extreme ultraviolet, Extreme ultraviolet lithography, Atomic force microscope, Photomasks, Inspection

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Inspection, Ruthenium, Failure analysis, Transmission electron microscopy, Ions, Silica, Multilayers

PROCEEDINGS ARTICLE | October 3, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lamps, Photomasks, Extreme ultraviolet lithography, Ruthenium, Oxygen, Mercury, Reticles, Semiconducting wafers, Reflectivity, Ultraviolet radiation

PROCEEDINGS ARTICLE | October 1, 2013
Proc. SPIE. 8886, 29th European Mask and Lithography Conference
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Reflectivity, Multilayers, Ions, Optical lithography, Ion beams, Deposition processes, Coating

PROCEEDINGS ARTICLE | September 23, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Polishing, Magnetorheological finishing, Extreme ultraviolet, Surface finishing, Chemical mechanical planarization, Particles, Photomasks, Surface roughness, Extreme ultraviolet lithography, Inspection

Showing 5 of 22 publications
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