Dr. Asher Klatchko
MTS at Applied Materials Inc
SPIE Involvement:
Publications (3)

Proceedings Article | 16 March 2009 Paper
Martin Burkhardt, J. C. Arnold, Z. Baum, S. Burns, J. Chang, J. Chen, J. Cho, V. Dai, Y. Deng, S. Halle, G. Han, S. Holmes, D. Horak, S. Kanakasabapathy, R. H. Kim, A. Klatchko, C. S. Koay, A. Krasnoperova, Y. Ma, E. McLellan, K. Petrillo, S. Schmitz, C. Tabery, Y. Yin, L. Zhuang, Y. Zou, J. Kye, V. Paruchuri, S. Mansfield, C. Spence, M. Colburn
Proceedings Volume 7274, 727404 (2009) https://doi.org/10.1117/12.814433
KEYWORDS: Etching, Lithography, Printing, Optical lithography, Double patterning technology, Resolution enhancement technologies, Logic, Metals, Photomasks, Tolerancing

Proceedings Article | 6 December 2004 Paper
Asher Klatchko, Peter Pirogovsky
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.561106
KEYWORDS: Optical lithography, Raster graphics, Transform theory, Optical proximity correction, Convolution, Image processing, Diffusion, Photomasks, Critical dimension metrology, Chromium

Proceedings Article | 17 December 2003 Paper
Paul Allen, Alex Buxbaum, Samuel Howells, Boaz Kenan, Asher Klatchko, Peter Pirogovsky, Robin Teitzel, Michael White
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518218
KEYWORDS: Artificial intelligence, Image enhancement, Photomasks, Vestigial sideband modulation, Scanning electron microscopy, Optical proximity correction, Deep ultraviolet, Evolutionary algorithms, Manufacturing, Data conversion

  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top