Dr. Asher Klatchko
MTS at Applied Materials Inc
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Metals, Printing, Photomasks, Double patterning technology, Tolerancing, Resolution enhancement technologies

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Optical lithography, Image processing, Diffusion, Chromium, Transform theory, Photomasks, Optical proximity correction, Convolution, Raster graphics, Critical dimension metrology

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Deep ultraviolet, Manufacturing, Scanning electron microscopy, Photomasks, Image enhancement, Artificial intelligence, Optical proximity correction, Data conversion, Vestigial sideband modulation, Evolutionary algorithms

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