Ashish Rathore
at imec
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 26 September 2019 Presentation + Paper
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Lithography, Electron beam lithography, Polymers, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers, Photoresist developing

Proceedings Article | 19 March 2018 Presentation + Paper
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Polymers, Photons, Electrons, Chemistry, Photoresist materials, Polymerization, Extreme ultraviolet, Chemical analysis, Extreme ultraviolet lithography, Chemical reactions

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top