Dr. Astrid Gettel
at GLOBALFOUNDRIES Dresden Module Two GmbH & Co KG
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Lithography, Reticles, Contamination, Sensors, Air contamination, Particles, Manufacturing, Humidity, Environmental sensing, Standards development

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