Mr. Atsuhiko Ikeuchi Profile

Atsuhiko Ikeuchi

at Toshiba Corp

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 4 April 2011 Paper

Validation of process cost effective layout refinement utilizing design intent

Sachiko Kobayashi, Atsuhiko Ikeuchi, Kazunari Kimura, Toshiya Kotani, Satoshi Tanaka, Suigen Kyoh, Shimon Maeda, Soichi Inoue

Proceedings Volume 7974, 79740G (2011) https://doi.org/10.1117/12.881485

KEYWORDS: Tolerancing, Manufacturing, Design for manufacturability, Integrated circuit design, Electronic design automation, Data conversion, Optical proximity correction, Data processing, Lithography, Critical dimension metrology

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Proceedings Article | 20 October 2006 Paper

Correcting lithography hot spots during physical-design implementation

Gerard Luk-Pat, Alexander Miloslavsky, Atsuhiko Ikeuchi, Hiroaki Suzuki, Suigen Kyoh, Kyoko Izuha, Frank Tseng, Linni Wen

Proceedings Volume 6349, 634920 (2006) https://doi.org/10.1117/12.692865

KEYWORDS: Model-based design, Lithography, Optical proximity correction, Metals, Resolution enhancement technologies, Semiconductors, Semiconducting wafers, Astatine, Data modeling, Process engineering

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Proceedings Article | 24 March 2006 Paper

Lithography oriented DfM for 65 nm and beyond

S. Kyoh, T. Kotani, S. Kobayashi, A. Ikeuchi, S. Inoue

Proceedings Volume 6156, 61560F (2006) https://doi.org/10.1117/12.656858

KEYWORDS: Lithography, Manufacturing, Optical proximity correction, Environmental management, Design for manufacturing, Metals, Design for manufacturability, Semiconducting wafers, Image processing, Semiconductors

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Proceedings Article | 24 March 2006 Paper

Development of hot spot fixer (HSF)

Toshiya Kotani, Suigen Kyoh, Sachiko Kobayashi, Takatoshi Inazu, Atsuhiko Ikeuchi, Yukihiro Urakawa, Soichi Inoue, Etsuya Morita, Simon Klaver, Takumi Horiuchi, Johan Peeters, Satoshi Kuramoto

Proceedings Volume 6156, 61560H (2006) https://doi.org/10.1117/12.657806

KEYWORDS: Lithography, Optical proximity correction, Design for manufacturing, Metals, Resolution enhancement technologies, Photomasks, Sensors, Semiconducting wafers, Semiconductors, Design for manufacturability

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Proceedings Article | 28 August 2003 Paper

Efficient hybrid optical proximity correction method based on the flow of design for manufacturability (DfM)

Toshiya Kotani, Hirotaka Ichikawa, Takanori Urakami, Shigeki Nojima, Sachiko Kobayashi, Yoko Oikawa, Satoshi Tanaka, Atsuhiko Ikeuchi, Kiminobu Suzuki, Soichi Inoue

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504271

KEYWORDS: Optical proximity correction, Lead, Computer aided design, Lithography, Photomasks, Image segmentation, Model-based design, Semiconducting wafers, Design for manufacturability, Design for manufacturing

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