Atsuhiko Ikeuchi
at Toshiba Corp
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 4 April 2011
Proc. SPIE. 7974, Design for Manufacturability through Design-Process Integration V
KEYWORDS: Lithography, Manufacturing, Data processing, Optical proximity correction, Critical dimension metrology, Data conversion, Tolerancing, Integrated circuit design, Electronic design automation, Design for manufacturability

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Semiconductors, Lithography, Data modeling, Metals, Optical proximity correction, Semiconducting wafers, Astatine, Model-based design, Process engineering, Resolution enhancement technologies

Proceedings Article | 24 March 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Semiconductors, Lithography, Sensors, Metals, Design for manufacturing, Photomasks, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies, Design for manufacturability

Proceedings Article | 24 March 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Semiconductors, Lithography, Metals, Image processing, Manufacturing, Design for manufacturing, Optical proximity correction, Semiconducting wafers, Environmental management, Design for manufacturability

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Image segmentation, Design for manufacturing, Photomasks, Optical proximity correction, Computer aided design, Semiconducting wafers, Model-based design, Lead, Design for manufacturability

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