Mr. Atsushi Onishi
at Osaka Univ
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Thin films, Electron beams, Silica, Silicon, Inspection, Electron microscopy, Photomasks, Semiconducting wafers, Signal detection, Defect inspection

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Electron beams, Defect detection, Inspection, Distortion, Scanning electron microscopy, Electron microscopy, Spatial resolution, Neodymium, Semiconducting wafers, Signal detection

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Wafer-level optics, Defect detection, Image processing, Inspection, Scanning electron microscopy, Electron microscopy, Projection systems, Semiconducting wafers, Signal detection, Prototyping

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Wafer-level optics, Electron beams, Imaging systems, Inspection, Optical inspection, Electron microscopy, Spatial resolution, Semiconducting wafers, Signal detection, Yield improvement

PROCEEDINGS ARTICLE | July 15, 2003
Proc. SPIE. 5041, Process and Materials Characterization and Diagnostics in IC Manufacturing
KEYWORDS: Reflection, Imaging systems, Metals, Inspection, Distortion, Image quality, Projection systems, Wafer inspection, Semiconducting wafers, Floods

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