Prof. Atsushi Takahashi Profile

Prof. Atsushi Takahashi

at Tokyo Institute of Technology

SPIE Involvement:

Author

Publications (17)

Proceedings Article | 10 April 2024 Presentation + Paper

Pre-training CNN for fast EUV lithography simulation including M3D effects

Hiroyoshi Tanabe, Akira Jinguji, Atsushi Takahashi

Proceedings Volume 12954, 129540I (2024) https://doi.org/10.1117/12.3009880

KEYWORDS: Education and training, Fourier transforms, 3D mask effects, Diffraction, Optical proximity correction, Extreme ultraviolet lithography, Extreme ultraviolet, Far field diffraction

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SPIE Journal Paper | 2 January 2024 Open Access

Accelerating extreme ultraviolet lithography simulation with weakly guiding approximation and source position dependent transmission cross coefficient formula

Hiroyoshi Tanabe, Akira Jinguji, Atsushi Takahashi

JM3, Vol. 23, Issue 01, 014201, (January 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.014201

KEYWORDS: 3D modeling, 3D mask effects, Diffraction, Extreme ultraviolet lithography, Light sources and illumination, Waveguides, Waveguide modes, Wave equations, Extreme ultraviolet, Fourier transforms

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Proceedings Article | 21 November 2023 Poster + Paper

A formulation of mask optimization into QUBO model for Ising machines

Yukihide Kohira, Haruki Nakayama, Naoki Nonaka, Tomomi Matsui, Atsushi Takahashi, Chikaaki Kodama

Proceedings Volume 12751, 127511D (2023) https://doi.org/10.1117/12.2687615

KEYWORDS: Source mask optimization, Tolerancing, Optical proximity correction, Semiconducting wafers, SRAF, Quantum annealing

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Proceedings Article | 21 November 2023 Presentation + Paper

Accelerating EUV lithography simulation with weakly guiding approximation and STCC formula

Hiroyoshi Tanabe, Akira Jinguji, Atsushi Takahashi

Proceedings Volume 12750, 127500D (2023) https://doi.org/10.1117/12.2688029

KEYWORDS: Photomasks, 3D modeling, Diffraction, Extreme ultraviolet lithography, Waveguides, Waveguide modes, Light sources and illumination, Extreme ultraviolet, Wave equations, Dielectric polarization

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SPIE Journal Paper | 15 June 2023 Open Access

Evaluation of convolutional neural network for fast extreme ultraviolet lithography simulation using imec 3 nm node mask patterns

Hiroyoshi Tanabe, Akira Jinguji, Atsushi Takahashi

JM3, Vol. 22, Issue 02, 024201, (June 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.2.024201

KEYWORDS: Education and training, Metals, Diffraction, 3D mask effects, Optical proximity correction, Fourier transforms, Convolutional neural networks, Extreme ultraviolet, Cadmium, Extreme ultraviolet lithography

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Proceedings Article | 28 April 2023 Presentation + Paper

Evaluation of CNN for fast EUV lithography simulation using iN3 logic mask patterns

Hiroyoshi Tanabe, Akira Jinguji, Atsushi Takahashi

Proceedings Volume 12495, 124951J (2023) https://doi.org/10.1117/12.2659063

KEYWORDS: 3D mask effects, Optical proximity correction, 3D modeling, Diffraction, Extreme ultraviolet lithography, Convolutional neural networks

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SPIE Journal Paper | 14 October 2022 Open Access

Data augmentation in extreme ultraviolet lithography simulation using convolutional neural network

Hiroyoshi Tanabe, Atsushi Takahashi

JM3, Vol. 21, Issue 04, 041602, (October 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.041602

KEYWORDS: Photomasks, Diffraction, Extreme ultraviolet lithography, 3D modeling, Fourier transforms, Cadmium, Convolutional neural networks, Semiconducting wafers, Optical proximity correction, Extreme ultraviolet

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Proceedings Article | 26 May 2022 Presentation + Paper

Data augmentation in EUV lithography simulation based on convolutional neural network

Hiroyoshi Tanabe, Atsushi Takahashi

Proceedings Volume 12052, 120520T (2022) https://doi.org/10.1117/12.2615267

KEYWORDS: Photomasks, Diffraction, Extreme ultraviolet lithography, 3D modeling, Fourier transforms, Convolutional neural networks, Semiconducting wafers, Neural networks, Near field, Extreme ultraviolet

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SPIE Journal Paper | 24 September 2021

Fast EUV lithography simulation using convolutional neural network

Hiroyoshi Tanabe, Shimpei Sato, Atsushi Takahashi

JM3, Vol. 20, Issue 04, 041202, (September 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.041202

KEYWORDS: Photomasks, 3D modeling, Diffraction, Polarization, Fourier transforms, Extreme ultraviolet lithography, Convolutional neural networks, Extreme ultraviolet, 3D acquisition, Waveguides

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Proceedings Article | 22 February 2021 Presentation + Paper

Fast 3D lithography simulation by convolutional neural network

Hiroyoshi Tanabe, Shimpei Sato, Atsushi Takahashi

Proceedings Volume 11614, 116140M (2021) https://doi.org/10.1117/12.2583683

KEYWORDS: Photomasks, Convolutional neural networks, 3D modeling, Systems modeling, Lithography, Waveguides, Electromagnetic simulation, Polarization, Finite-difference time-domain method, Extreme ultraviolet

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Proceedings Article | 20 September 2020 Presentation + Paper

Fast 3D lithography simulation by convolutional neural network: POC study

Hiroyoshi Tanabe, Shimpei Sato, Atsushi Takahashi

Proceedings Volume 11518, 115180L (2020) https://doi.org/10.1117/12.2575971

KEYWORDS: Photomasks, Convolutional neural networks, Systems modeling, Lithography, 3D modeling, Finite-difference time-domain method, Extreme ultraviolet, Optical lithography, Optical simulations, Fourier transforms

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Proceedings Article | 23 March 2020 Paper

A feature selection method for weak classifier based hotspot detection

Hidekazu Takahashi, Hiroki Ogura, Shimpei Sato, Atsushi Takahashi, Chikaaki Kodama

Proceedings Volume 11328, 113281E (2020) https://doi.org/10.1117/12.2559358

KEYWORDS: Feature extraction, Feature selection, Lithography, Simulation of CCA and DLA aggregates, Machine learning, Manufacturing, Computer programming, Semiconducting wafers, Design for manufacturability, Very large scale integration

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Proceedings Article | 23 March 2020 Presentation + Paper

Process variation-aware mask optimization with iterative improvement by subgradient method and boundary ﬂipping

Rina Azuma, Yukihide Kohira, Tomomi Matsui, Atsushi Takahashi, Chikaaki Kodama

Proceedings Volume 11328, 113280O (2020) https://doi.org/10.1117/12.2552514

KEYWORDS: Photomasks, Image processing, Source mask optimization, Optical proximity correction, Mathematical modeling, Model-based design, Lithography, SRAF, System on a chip, Resolution enhancement technologies

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SPIE Journal Paper | 11 March 2016

Yield-aware mask assignment by positive semidefinite relaxation in triple patterning using cut process

Yukihide Kohira, Chikaaki Kodama, Tomomi Matsui, Atsushi Takahashi, Shigeki Nojima, Satoshi Tanaka

JM3, Vol. 15, Issue 02, 021207, (March 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021207

KEYWORDS: Computer engineering, Photomasks, Optical lithography, Double patterning technology, Computer programming, Overlay metrology, Detection and tracking algorithms, Communication engineering, Lithography, Logic

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Proceedings Article | 26 March 2015 Paper

Yield-aware mask assignment using positive semi-definite relaxation in LELECUT triple patterning

Yukihide Kohira, Chikaaki Kodama, Tomomi Matsui, Atsushi Takahashi, Shigeki Nojima, Satoshi Tanaka

Proceedings Volume 9427, 94270B (2015) https://doi.org/10.1117/12.2085285

KEYWORDS: Photomasks, Optical lithography, Lithography, Overlay metrology, Double patterning technology, Computer programming, Design for manufacturability, Fabrication, Extreme ultraviolet, Logic

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Proceedings Article | 28 March 2014 Paper

Localization concept of re-decomposition area to fix hotspots for LELE process

Yoko Yokoyama, Keishi Sakanushi, Yukihide Kohira, Atsushi Takahashi, Chikaaki Kodama, Satoshi Tanaka, Shigeki Nojima

Proceedings Volume 9053, 90530V (2014) https://doi.org/10.1117/12.2046263

KEYWORDS: Photomasks, Optical proximity correction, Lithography, Double patterning technology, Optical simulations, Semiconducting wafers, Optical lithography, Etching, Design for manufacturing, Design for manufacturability

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Proceedings Article | 28 March 2014 Paper

Yield-aware decomposition for LELE double patterning

Yukihide Kohira, Yoko Yokoyama, Chikaaki Kodama, Atsushi Takahashi, Shigeki Nojima, Satoshi Tanaka

Proceedings Volume 9053, 90530T (2014) https://doi.org/10.1117/12.2046180

KEYWORDS: Legal, Double patterning technology, Photomasks, Semiconducting wafers, Manufacturing, Lithography, Detection and tracking algorithms, Optical proximity correction, Image quality, Extreme ultraviolet

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Showing 5 of 17 publications

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