Dr. Atsushi Uemoto
at Hitachi High-Tech Science Corp
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Diamond, Contamination, Image processing, Scanners, Particles, Manufacturing, Atomic force microscopy, Scanning electron microscopy, Photomasks, Critical dimension metrology

PROCEEDINGS ARTICLE | November 9, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Opacity, Quartz, Ions, Monte Carlo methods, Transmittance, Photomasks, Gallium, Binary data, 193nm lithography

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Opacity, Etching, Control systems, Atomic force microscopy, Photomasks, Computer aided design, Acoustics, Surface conduction electron emitter displays, 193nm lithography

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Imaging systems, Etching, Chromium, Control systems, Transmittance, Photomasks, Computer aided design, Surface conduction electron emitter displays, 193nm lithography

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Carbon, Lithography, Image resolution, Control systems, Raman spectroscopy, Transmittance, Photomasks, Computer aided design, Surface conduction electron emitter displays, 193nm lithography

PROCEEDINGS ARTICLE | June 2, 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Semiconductors, Lithography, Manufacturing, Scanning electron microscopy, Printing, Software development, Optical proximity correction, Computer aided design, Semiconducting wafers, Solid modeling

Showing 5 of 6 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top