Dr. Atsushi Uemoto
at Hitachi High-Tech Science Corp
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Diamond, Contamination, Image processing, Scanners, Particles, Manufacturing, Atomic force microscopy, Scanning electron microscopy, Photomasks, Critical dimension metrology

Proceedings Article | 9 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Opacity, Quartz, Ions, Monte Carlo methods, Transmittance, Photomasks, Gallium, Binary data, 193nm lithography

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Opacity, Etching, Control systems, Atomic force microscopy, Photomasks, Computer aided design, Acoustics, Surface conduction electron emitter displays, 193nm lithography

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Imaging systems, Etching, Chromium, Control systems, Transmittance, Photomasks, Computer aided design, Surface conduction electron emitter displays, 193nm lithography

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Carbon, Lithography, Image resolution, Control systems, Raman spectroscopy, Transmittance, Photomasks, Computer aided design, Surface conduction electron emitter displays, 193nm lithography

Showing 5 of 6 publications
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