Aurelien Sarrazin
at CEA-LETI
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | April 10, 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Lithography, Electron beam lithography, Etching, Line width roughness, Directed self assembly, Nanoimprint lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers, System on a chip

SPIE Journal Paper | August 25, 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Directed self assembly, Annealing, Polymethylmethacrylate, Line width roughness, Picosecond phenomena, Semiconducting wafers, Lithography, Optical lithography, Image registration, Plasma

PROCEEDINGS ARTICLE | March 23, 2016
Proc. SPIE. 9782, Advanced Etch Technology for Nanopatterning V
KEYWORDS: Polymethylmethacrylate, Etching, Chemistry, Xenon, Directed self assembly, Plasma etching, Picosecond phenomena, Semiconducting wafers, Carbon monoxide, Plasma

PROCEEDINGS ARTICLE | March 22, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Optical lithography, Defect detection, Etching, Image processing, Annealing, Materials processing, Inspection, Scanning electron microscopy, Photomasks, Directed self assembly, Picosecond phenomena, Critical dimension metrology, Semiconducting wafers, Molecular self-assembly

PROCEEDINGS ARTICLE | March 21, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Lithography, Optical lithography, Statistical analysis, Polymethylmethacrylate, Polymers, Annealing, Image registration, Photomasks, Line width roughness, Directed self assembly, Line edge roughness, Semiconducting wafers, Polymer thin films, 193nm lithography

PROCEEDINGS ARTICLE | March 17, 2015
Proc. SPIE. 9428, Advanced Etch Technology for Nanopatterning IV
KEYWORDS: Polymethylmethacrylate, Etching, Dry etching, Chemistry, Scanning electron microscopy, Directed self assembly, Picosecond phenomena, Critical dimension metrology, Semiconducting wafers, Carbon monoxide

Showing 5 of 7 publications
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