Dr. Aurélien Sarrazin Profile

Dr. Aurélien Sarrazin

at CEA-LETI

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 9 April 2024 Presentation + Paper

Life cycle assessment of etching processes for FDSOI transistors technologies

Mickaël Renaud, Aurélien Sarrazin, Joao Lopes-Barbosa, Yannick Rivoira, Isabelle Servin, François Boulard

Proceedings Volume 12958, 129580K (2024) https://doi.org/10.1117/12.3009969

KEYWORDS: Etching, Plasma etching, Plasma, Climate change, Gases, Transistors, Power consumption, Front end of line, Sustainable technology, CMOS technology

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Proceedings Article | 9 April 2024 Poster + Paper

Fabrication of 3D microstructures by controlled bending of suspended microdisks

R. Feougier, A. Aliane, A. Sarrazin, Z. Mehrez, N. Posseme, R. Tiron

Proceedings Volume 12956, 129560K (2024) https://doi.org/10.1117/12.3009898

KEYWORDS: Fabrication, 3D microstructuring, Silicon, Deformation, Bending stress, Tin, Microlens, Titanium, Atomic force microscopy

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Proceedings Article | 1 May 2023 Presentation + Paper

Chitosan as a water-based photoresist for DUV lithography

Isabelle Servin, Alexandre Teolis, Arnaud Bazin, Aurélien Sarrazin, Paule Durin, Olha Sysova, Corinne Gablin, Benoît Saudet, Didier Leonard, Olivier Soppera, Jean-Louis Leclercq, Yann Chevolot, Raluca Tiron, Thierry Delair, Stephane Trombotto

Proceedings Volume 12498, 1249818 (2023) https://doi.org/10.1117/12.2658423

KEYWORDS: Semiconducting wafers, Silicon, Deep ultraviolet, Lithography, Photoacid generators, Photoresist processing, Plasma etching, Etching, Optical lithography, Film thickness, Sustainability

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Proceedings Article | 26 May 2022 Poster + Paper

Pattern customization on 193 immersion lithography by negative tone development process and multiple exposures

Ivanie Mendes, Michael May, Jérôme Rêche, Raluca Tiron, Aurélien Sarrazin, Olivier Dubreuil

Proceedings Volume 12051, 120510Q (2022) https://doi.org/10.1117/12.2614018

KEYWORDS: Reticles, Lithography, Semiconducting wafers, Scanners, Silicon, Overlay metrology, Scanning electron microscopy, Process control, Image processing, Photomasks, Immersion lithography

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Proceedings Article | 10 April 2017 Presentation + Paper

Nanoimprint, DSA, and multi-beam lithography: patterning technologies with new integration challenges

S. Landis, H. Teyssedre, G. Claveau, I. Servin, F. Delachat, M. L. Pourteau, A. Gharbi, P. Pimenta Barros, R. Tiron, L. Nouri, N. Possemé, M. May, P. Brianceau, S. Barnola, Y. Blancquaert, J. Pradelles, P. Essomba, A. Bernadac, B. Dal'zotto, S. Bos, M. Argoud, G. Chamiot-Maitral, A. Sarrazin, C. Tallaron, C. Lapeyre, L. Pain

Proceedings Volume 10149, 101490K (2017) https://doi.org/10.1117/12.2259966

KEYWORDS: Directed self assembly, Lithography, Line width roughness, Nanoimprint lithography, Semiconducting wafers, Etching, Electron beam lithography, System on a chip, Critical dimension metrology, Photoresist processing

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SPIE Journal Paper | 25 August 2016

Surface affinity role in graphoepitaxy of lamellar block copolymers

Guillaume Claveau, Patrick Quemere, Maxime Argoud, Jerome Hazart, Patricia Pimenta-Barros, Aurelien Sarrazin, Nicolas Posseme, Raluca Tiron, Xavier Chevalier, Celia Nicolet, Christophe Navarro

JM3, Vol. 15, Issue 03, 031604, (August 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.3.031604

KEYWORDS: Directed self assembly, Annealing, Polymethylmethacrylate, Line width roughness, Picosecond phenomena, Semiconducting wafers, Lithography, Optical lithography, Image registration, Plasma

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Proceedings Article | 23 March 2016 Paper

PMMA removal selectivity to PS using dry etch approach: sub-10nm patterning application

A. Sarrazin, N. Posseme, P. Pimenta Barros, S. Barnola, G. Claveau, A. Gharbi, M. Argoud, G. Chamiot-Maitral, R. Tiron, C. Nicolet, C. Navarro, C. Cardinaud

Proceedings Volume 9782, 97820G (2016) https://doi.org/10.1117/12.2220586

KEYWORDS: Directed self assembly, Polymethylmethacrylate, Chemistry, Picosecond phenomena, Etching, Xenon, Plasma, Carbon monoxide, Plasma etching, Semiconducting wafers

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Proceedings Article | 22 March 2016 Paper

Process highlights to enhance DSA contact patterning performances

A. Gharbi, R. Tiron, M. Argoud, G. Chamiot-Maitral, A. Fouquet, C. Lapeyre, P. Pimenta Barros, A. Sarrazin, I. Servin, F. Delachat, S. Bos, S. Bérard-Bergery, J. Hazart, X. Chevalier, C. Nicolet, C. Navarro, I. Cayrefourcq, S. Bouanani, C. Monget

Proceedings Volume 9777, 97770T (2016) https://doi.org/10.1117/12.2219210

KEYWORDS: Directed self assembly, Optical lithography, Inspection, Lithography, Etching, Semiconducting wafers, Scanning electron microscopy, Defect detection, Critical dimension metrology, Materials processing, Photomasks, Picosecond phenomena, Annealing, Molecular self-assembly, Image processing

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Proceedings Article | 21 March 2016 Paper

Surface affinity role in graphoepitaxy of lamellar block copolymers

G. Claveau, P. Quemere, M. Argoud, J. Hazart, P. Pimenta Barros, A. Sarrazin, N. Posseme, R. Tiron, X. Chevalier, C. Nicolet, C. Navarro

Proceedings Volume 9779, 97791F (2016) https://doi.org/10.1117/12.2219131

KEYWORDS: Line width roughness, Polymers, Directed self assembly, Optical lithography, Line edge roughness, 193nm lithography, Semiconducting wafers, Statistical analysis, Polymer thin films, Annealing, Polymethylmethacrylate, Lithography, Image registration, Photomasks

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Proceedings Article | 17 March 2015 Paper

DSA planarization approach to solve pattern density issue

P. Pimenta Barros, A. Gharbi, Aurélien Sarrazin, R. Tiron, N. Posseme, S. Barnola, S. Bos, C. Tallaron, G. Claveau, X. Chevalier, M. Argoud, Isabelle Servin, C. Navarro, Célia Nicolet, C. Lapeyre, C. Monget

Proceedings Volume 9428, 94280D (2015) https://doi.org/10.1117/12.2086810

KEYWORDS: Polymethylmethacrylate, Etching, Critical dimension metrology, Picosecond phenomena, Semiconducting wafers, Chemistry, Scanning electron microscopy, Carbon monoxide, Dry etching, Directed self assembly

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Proceedings Article | 11 September 2013 Paper

Strategies for self-organization of Au nanoparticles assisted by copolymer templates

T. Maurer, Aurélien Sarrazin, A. Plaud, J. Béal, R. Nicolas, S. Lamarre, J. Proust, K. Nomenyo, Z. Herro, M. Kazan, G. Lerondel, J. Plain, P.-M. Adam, A.-M. Ritcey

Proceedings Volume 8809, 88092E (2013) https://doi.org/10.1117/12.2025144

KEYWORDS: Gold, Nanoparticles, Polymethylmethacrylate, Etching, Thin films, Annealing, Refractive index, Picosecond phenomena, Sensors, Reactive ion etching

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Showing 5 of 11 publications

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