Avi Cohen
Application Manager at Carl Zeiss SMS Ltd
SPIE Involvement:
Author
Area of Expertise:
Photomask , Photo-Lithography , Overlay , CD Uniformity , Registration , Lasers
Publications (22)

Proceedings Article | 3 October 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Reticles, Optical lithography, Scanners, 3D modeling, Photomasks, Line width roughness, Critical dimension metrology, Semiconducting wafers, Failure analysis

Proceedings Article | 29 August 2019
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Lithography, Metrology, Deep ultraviolet, Image processing, Scanners, Error analysis, Photomasks, Chemical elements, Semiconducting wafers, Overlay metrology

Proceedings Article | 29 August 2019
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Lithography, Metrology, Logic, Optical lithography, Metals, Manufacturing, Printing, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Metrology, Deep ultraviolet, Scanners, Photomasks, Semiconducting wafers, Overlay metrology

Proceedings Article | 16 October 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Metrology, Optical parametric oscillators, Manufacturing, Image restoration, Image registration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Overlay metrology

Showing 5 of 22 publications
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