Dr. Aviv Frommer
Research Scientist at Lumus Ltd
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Oxides, Lithography, Metrology, Finite-difference time-domain method, Imaging systems, Silicon, Image analysis, Process control, Electromagnetic simulation, Overlay metrology

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Reticles, Polishing, Metrology, Data modeling, Scanners, Manufacturing, Optical alignment, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Lithography, Reticles, Metrology, Data modeling, Scanners, Manufacturing, Dysprosium, Semiconducting wafers, Overlay metrology, Personal protective equipment

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Optical design, MATLAB, Image processing, Computer simulations, Signal processing, Photoresist processing, Semiconducting wafers, Performance modeling, Overlay metrology, Device simulation

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