Dr. Aviv Frommer
Research Scientist at Lumus Ltd
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Overlay metrology, Oxides, Metrology, Silicon, Image analysis, Finite-difference time-domain method, Lithography, Process control, Electromagnetic simulation, Imaging systems

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Reticles, Overlay metrology, Scanners, Data modeling, Semiconducting wafers, Metrology, Chemical mechanical planarization, Manufacturing, Polishing, Optical alignment

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Reticles, Overlay metrology, Semiconducting wafers, Scanners, Dysprosium, Metrology, Data modeling, Personal protective equipment, Lithography, Manufacturing

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Overlay metrology, Signal processing, Photoresist processing, Semiconducting wafers, Device simulation, Optical design, Computer simulations, MATLAB, Image processing, Performance modeling

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