Dr. Avron Ger
Technical VP - Strategic Development at Nova Measuring Instruments Ltd
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 12 May 2020 Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Ruthenium, Etching, Semiconducting wafers, Machine learning, Metals, Transmission electron microscopy, Scatterometry, Photomasks, Resistance, Line edge roughness

Proceedings Article | 2 July 2019 Presentation + Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Machine learning, Scatterometry, Copper

Proceedings Article | 25 June 2019 Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Machine learning, Metrology, Inspection, Process control, Optical lithography, Capacitance, Lithography

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Machine learning, Semiconducting wafers, Capacitance, Resistance, Critical dimension metrology, Etching, Process control, Diffractive optical elements, Oxides, Scatterometry

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Zirconium dioxide, Scatterometry, Metrology, Chemical species, Atomic force microscopy, Semiconducting wafers, Deposition processes, Data modeling, Machine learning, Scatter measurement

Showing 5 of 8 publications
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