Axel Feicke
Member Technical Staff at Advanced Mask Technology Ctr GmbH Co KG
SPIE Involvement:
Author
Area of Expertise:
Optical & Ebeam lithography , Semiconductor Manufacturing , Coater, bakes, developer , Mask making , Photo resists
Publications (10)

Proceedings Article | 28 September 2017 Paper
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Photomasks, Electrochemical etching, Phase shifts

Proceedings Article | 10 May 2016 Paper
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Reticles, Electronics, Inspection, Scanning electron microscopy, Photomasks, Line width roughness, SRAF, Critical dimension metrology, Binary data, Standards development

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Reticles, Principal component analysis, Statistical analysis, Cadmium, Etching, Photomasks, Critical dimension metrology, Photoresist processing, Chemically amplified resists

Proceedings Article | 25 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Reticles, Metrology, Principal component analysis, Data modeling, Error analysis, Manufacturing, Photomasks, Critical dimension metrology, Photoresist processing, Process engineering

Proceedings Article | 28 June 2005 Paper
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Reticles, Etching, Manufacturing, Chromium, Control systems, Photomasks, Forward error correction, Photoresist processing, Semiconducting wafers, Standards development

Showing 5 of 10 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top