Dr. Axel Nackaerts
at IMEC
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 12, 2008
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Optical lithography, Etching, Electroluminescence, Monte Carlo methods, Very large scale integration, Line width roughness, Transistors, Double patterning technology, Critical dimension metrology, Device simulation

PROCEEDINGS ARTICLE | March 21, 2007
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Lithography, Logic, Statistical analysis, Etching, Transistors, Critical dimension metrology, Semiconducting wafers, Overlay metrology, Instrument modeling

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Oscillators, Etching, Scanners, Annealing, Transistors, Picosecond phenomena, Critical dimension metrology, Analog electronics, Semiconducting wafers, Digital electronics

PROCEEDINGS ARTICLE | May 5, 2005
Proc. SPIE. 5756, Design and Process Integration for Microelectronic Manufacturing III
KEYWORDS: Lithography, Lithographic illumination, Scanners, Manufacturing, Printing, Microelectronics, Integrated optics, Double patterning technology, Resolution enhancement technologies, Fiber optic illuminators

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