Dr. Axel M. Zibold
Vice President Sales & Customer Service at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (28)

PROCEEDINGS ARTICLE | December 11, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Phase shifting, Metrology, Scanners, Image registration, Printing, Photomasks, Phase measurement, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Metrology, Scanners, Manufacturing, Image acquisition, Data acquisition, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Phase shifting, Optical lithography, Silica, Etching, Scanners, Photomasks, Tantalum, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | June 21, 2006
Proc. SPIE. 6281, 22nd European Mask and Lithography Conference
KEYWORDS: Semiconductors, Reticles, Polarization, Scanners, Printing, Transmittance, Photomasks, Immersion lithography, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Reticles, Polarization, Scanners, Optical testing, Printing, Photomasks, Immersion lithography, Semiconducting wafers, Binary data

PROCEEDINGS ARTICLE | May 19, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Optical lithography, Etching, Transmittance, Photomasks, Nanoimprint lithography, Tantalum, Semiconducting wafers, Tolerancing, Phase shifts

Showing 5 of 28 publications
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